Inventor

Hyeon-Deok Lee

Inventor

Seoul, KR

Overview

1998–2012

Patent span

Electricity

Primary field (CPC H)

Patents· 30 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary

H10DInorganic electric semiconductor devices28%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%

H10BElectronic memory devices19%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1018%

C23CCoating metallic material6%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

C25CProcesses for the electrolytic production, recovery or refining of metals1%

C25DProcesses for the electrolytic or electrophoretic production of coatings1%

Y10TTechnical subjects covered by former us classification1%

PatentTitleYear

8,304,343'Method of manufacturing a metal wiring structure'2012 8,053,374'Method of manufacturing a metal wiring structure'2011 7,741,222'Etch stop structure and method of manufacture, and semiconductor device and method of manufacture'2010 7,563,677'Recessed gate electrode and method of forming the same and semiconductor device having the recessed gate electrode and method of manufacturing the same'2009 7,524,724'Method of forming titanium nitride layer and method of fabricating capacitor using the same'2009 7,504,725'Semiconductor memory device having low-resistance tungsten line and method of manufacturing the semiconductor memory device'2009 7,410,869'Method of manufacturing a semiconductor device'2008 7,364,967'Methods of forming storage capacitors for semiconductor devices'2008 7,311,109'Method for cleaning a processing chamber and method for manufacturing a semiconductor device'2007 7,238,585'Method of forming a storage electrode of a semiconductor device'2007 7,135,407'Method of manufacturing a semiconductor device'2006 7,125,774'Method of manufacturing transistor having recessed channel'2006 7,122,468'Methods of fabricating integrated circuit conductive contact structures including grooves'2006 7,119,029'Method of oxidizing a silicon substrate and method of forming an oxide layer using the same'2006 7,119,392'Storage electrode of a semiconductor device and method of forming the same'2006 7,037,828'Semiconductor device having a capping layer including cobalt and method of fabricating the same'2006 7,008,844'Method of forming a gate of a non-volatile memory device'2006 6,964,922'Methods for forming metal interconnections for semiconductor devices having multiple metal depositions'2005 6,913,979'Method of manufacturing a metal oxide semiconductor transistor'2005 6,905,960'Method of forming a contact in a semiconductor device'2005 6,774,029'Method for forming a conductive film and a conductive pattern of a semiconductor device'2004 6,747,354'Semiconductor devices having multilevel interconnections and methods for manufacturing the same'2004 6,673,718'Methods for forming aluminum metal wirings'2004 6,623,798'Chemical vapor deposition method for depositing silicide and apparatus for performing the same'2003 6,607,654'Copper-plating elecrolyte containing polyvinylpyrrolidone and method for forming a copper interconnect'2003 6,399,457'Semiconductor device having capacitor and method of manufacturing the same'2002 6,372,616'Method of manufacturing an electrical interconnection of a semiconductor device using an erosion protecting plug in a contact hole of interlayer dielectric layer'2002 6,261,890'Semiconductor device having capacitor and method of manufacturing the same'2001 6,010,940'Methods for fabricating CVD TiN barrier layers for capacitor structures'2000 5,742,472'Stacked capacitors for integrated circuit devices and related methods'1998

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1998–2012Patents assigned to SAMSUNG ELECTRONICS CO LTD (30)· patent assignee history

1998–2012Based in Seoul, KR· patent location history

2012Patents assigned to CHOI GIL-HEYUN (1)· patent assignee history

2012Patents assigned to CHOI KYUNG-IN (1)· patent assignee history

2012Patents assigned to LEE HYEON-DEOK (1)· patent assignee history

2012Patents assigned to LEE JONG-MYEONG (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SAMSUNG ELECTRONICS CO LTD	30	1998–2012
CHOI GIL-HEYUN	1	2012
CHOI KYUNG-IN	1	2012
LEE HYEON-DEOKself	1	2012
LEE JONG-MYEONG	1	2012

Locations

Location	Patents	Span
Seoul, KR	30	1998–2012