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Inventor

Richard Charles Taddiken

Inventor
Santee, CA, US

Overview

1→
Patents
2015
Patent span
Physics
Primary field (CPC G)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%
G05DSystems for controlling or regulating non-electric variables25%
H05GX-ray technique25%
Y10TTechnical subjects covered by former us classification25%
PatentTitleYear
8,969,838'Systems and methods for protecting an EUV light source chamber from high pressure source material leaks'2015

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2015Patents assigned to ASML NETHERLANDS BV (1)· patent assignee history
2015Patents assigned to RAMADURAI KRISHNA (1)· patent assignee history
2015Patents assigned to TADDIKEN RICHARD CHARLES (1)· patent assignee history
2015Patents assigned to VASCHENKO GEORGIY O (1)· patent assignee history
2015Based in Santee, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV12015
RAMADURAI KRISHNA12015
TADDIKEN RICHARD CHARLESself12015
VASCHENKO GEORGIY O12015
Locations
LocationPatentsSpan
Santee, California, US12015