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Inventor

Nobuhiro Nishizaki

Inventor
Osaka, JP

Overview

3→
Patents
2001–2019
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
B01DSeparation11%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form11%
C23FNon-mechanical removal of metallic material from surface11%
D04HMaking textile fabrics, e.g. from fibres or filamentary material11%
D10BIndexing scheme associated with sublasses of section d, relating to textiles11%
H01JElectric discharge tubes or discharge lamps11%
H01LSemiconductor devices11%
PatentTitleYear
10,232,293Fiber laminate and manufacturing method thereof20199,583,355'Plasma processing apparatus and plasma processing method'20176,218,196'Etching apparatus, etching method, manufacturing method of a semiconductor device, and semiconductor device'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001Patents assigned to MITSUBISHI ELECTRIC CORP (1)· patent assignee history
2001Patents assigned to MITSUBISHI ELECTRIC ENG (1)· patent assignee history
2001Based in Tokyo, JP· patent location history
2017–2019Patents assigned to PANASONIC IP MAN CO LTD (2)· patent assignee history
2017Patents assigned to PANASONIC CORP (1)· patent assignee history
2017–2019Based in Osaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
PANASONIC IP MAN CO LTD22017–2019
MITSUBISHI ELECTRIC CORP12001
MITSUBISHI ELECTRIC ENG12001
PANASONIC CORP12017
Locations
LocationPatentsSpan
Osaka, JP22017–2019
Tokyo, JP12001