LexDanaLexDanabeta
Inventor

Anna Tchikoulaeva

Inventor
Dresden, DE

Overview

2→
Patents
2011–2012
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices100%
PatentTitleYear
8,338,061'Fluorine-passivated reticles for use in lithography and methods for fabricating the same'20127,985,513'Fluorine-passivated reticles for use in lithography and methods for fabricating the same'2011

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2011–2012Patents assigned to ADVANCED MICRO DEVICES INC (2)· patent assignee history
2011–2012Based in Dresden, DE· patent location history
2012Patents assigned to LEVINSON HARRY J (1)· patent assignee history
2012Patents assigned to OKOROANYANWU UZODINMA (1)· patent assignee history
2012Patents assigned to TCHIKOULAEVA ANNA (1)· patent assignee history
2012Patents assigned to WIRTZ RENE (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ADVANCED MICRO DEVICES INC22011–2012
LEVINSON HARRY J12012
OKOROANYANWU UZODINMA12012
TCHIKOULAEVA ANNAself12012
WIRTZ RENE12012
Locations
LocationPatentsSpan
Dresden, DE22011–2012