Inventor
Mitchell Lawrence Wright
Inventor
Rochester, NY, US
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H05Kprimary
H05KPrinted circuits31%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices23%
H01BCables23%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them8%
G03CPhotosensitive materials for photographic purposes8%
Y10TTechnical subjects covered by former us classification8%
PatentTitleYear
9,754,704'Making thin-film multi-layer micro-wire structure'20179,591,752'Articles with conductive micro-wire pattern'20179,288,901'Thin-film multi-layer micro-wire structure'20169,155,201'Preparation of articles with conductive micro-wire pattern'20159,099,227'Method of forming conductive films with micro-wires'20156,407,767'Apparatus for exposing sensitometric and bar code data onto photosensitive media'2002Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2002–2017Patents assigned to EASTMAN KODAK CO (6)· patent assignee history
2002–2017Based in Rochester, NY, US· patent location history
2015–2017Patents assigned to WANG YONGCAI (4)· patent assignee history
2015–2017Patents assigned to WRIGHT MITCHELL LAWRENCE (4)· patent assignee history
2015Patents assigned to LEBENS JOHN ANDREW (2)· patent assignee history
2016–2017Patents assigned to COK RONALD STEVEN (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EASTMAN KODAK CO | 6 | 2002–2017 |
| WANG YONGCAI | 4 | 2015–2017 |
| WRIGHT MITCHELL LAWRENCEself | 4 | 2015–2017 |
| COK RONALD STEVEN | 2 | 2016–2017 |
| LEBENS JOHN ANDREW | 2 | 2015 |
Locations
| Location | Patents | Span |
|---|---|---|
| Rochester, New York, US | 6 | 2002–2017 |