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Inventor

Christian Marinus Leewis

Inventor
Maastricht, NL

Overview

10→
Patents
2013–2020
Patent span
Physics
Primary field (CPC G)

Patents· 10 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices71%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
G01NInvestigating or analysing materials by determining their chemical or physical properties7%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them7%
PatentTitleYear
10,871,716Metrology robustness based on through-wavelength similarity202010,394,132Metrology robustness based on through-wavelength similarity20199,939,735Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method20189,594,299'Method of determining focus, inspection apparatus, patterning device, substrate and device manufacturing method'20179,436,099'Lithographic focus and dose measurement using a 2-D target'20168,982,328'Method and apparatus for overlay measurement'20158,891,061'Lithographic focus and dose measurement using a 2-D target'20148,848,195'Inspection method and apparatus, lithographic apparatus, lithographic processing cell and device manufacturing method for determining a property of a substrate'20148,685,626'Method of measuring a characteristic'20148,502,955'Method of determining a characteristic'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2020Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2013–2015Patents assigned to LEEWIS CHRISTIAN MARINUS (5)· patent assignee history
2013–2015Patents assigned to QUAEDACKERS JOHANNES ANNA (4)· patent assignee history
2013–2015Patents assigned to VANOPPEN PETER CLEMENT PAUL (3)· patent assignee history
2013–2015Patents assigned to MEGENS HENRICUS JOHANNES LAMBERTUS (2)· patent assignee history
2013–2018Based in Maastricht, NL· patent location history
2019–2020Based in Eindhoven, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV102013–2020
LEEWIS CHRISTIAN MARINUSself52013–2015
QUAEDACKERS JOHANNES ANNA42013–2015
VANOPPEN PETER CLEMENT PAUL32013–2015
MEGENS HENRICUS JOHANNES LAMBERTUS22013–2015
Locations
LocationPatentsSpan
Maastricht, NL82013–2018
Eindhoven, NL22019–2020