Inventor

NISHANT SINHA

Inventor
IN

Overview

9→
Patents
2022–2025
Patent span
Physics
Primary field (CPC G)

Patents· 9 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B29Cprimary
B29CShaping or joining of plastics8%
B33YAdditive manufacturing, i.e. manufacturing of three-dimensional [3d] objects by additive deposition, additive agglomeration or additive layering, e.g. by 3d printing, stereolithography or selective laser sintering8%
G06FElectric digital data processing8%
G06QInformation and communication technology [ict] specially adapted for administrative, commercial, financial, managerial or supervisory purposes8%
B05DProcesses for applying fluent materials to surfaces, in general6%
C08JWorking-up6%
G06NComputing arrangements based on specific computational models6%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts4%
B32BLayered products, i.e. products built-up of strata of flat or non-flat, e.g. cellular or honeycomb, form4%
G10LSpeech analysis techniques or speech synthesis4%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2022–2024Patents assigned to BOEING CO (4)· patent assignee history
2022–2024Patents assigned to CAPITAL ONE SERVICES LLC (3)· patent assignee history
2022Patents assigned to FRACTAL ANALYTICS PRIVATE LTD (1)· patent assignee history
2022–2025Based in IN· patent location history
2022Based in US· patent location history
2025Patents assigned to SAMSUNG ELECTRONICS CO LTD (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
BOEING CO42022–2024
CAPITAL ONE SERVICES LLC32022–2024
FRACTAL ANALYTICS PRIVATE LTD12022
SAMSUNG ELECTRONICS CO LTD12025
Locations
LocationPatentsSpan
IN82022–2025
US12022