LexDanaLexDanabeta
Inventor

Raymond L. Lavoie, Jr.

Inventor
Hockessin, DE, US

Overview

3→
Patents
2014–2017
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C09Gprimary
C09GPolishing compositions22%
H01LSemiconductor devices22%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1022%
B24BMachines, devices, or processes for grinding or polishing11%
C09KMaterials for miscellaneous applications, not provided for elsewhere11%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1011%
PatentTitleYear
9,731,398'Polyurethane polishing pad'20179,275,899'Chemical mechanical polishing composition and method for polishing tungsten'20168,865,013'Method for chemical mechanical polishing tungsten'2014

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2014–2016Patents assigned to ROHM & HAAS ELECT MAT (2)· patent assignee history
2014Patents assigned to GUO YI (1)· patent assignee history
2014Patents assigned to LAVOIE JR RAYMOND L (1)· patent assignee history
2014Patents assigned to LEE JERRY (1)· patent assignee history
2014Based in Millsboro, DE, US· patent location history
2016–2017Based in Hockessin, DE, US· patent location history
2017Patents assigned to DOW GLOBAL TECHNOLOGIES LLC (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ROHM & HAAS ELECT MAT22014–2016
DOW GLOBAL TECHNOLOGIES LLC12017
GUO YI12014
LAVOIE JR RAYMOND Lself12014
LEE JERRY12014
Locations
LocationPatentsSpan
Hockessin, Delaware, US22016–2017
Millsboro, Delaware, US12014