Inventor

Hidero Takahashi

Inventor
Osaka, JP

Overview

3→
Patents
1976–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B05Dprimary
B05DProcesses for applying fluent materials to surfaces, in general9%
B29BPreparation or pretreatment of the material to be shaped9%
B29KIndexing scheme associated with subclasses b29b, b29c or b29d, relating to moulding materials or to materials for moulds, reinforcements, fillers or preformed parts, e.g. inserts9%
C02FTreatment of water, waste water, sewage, or sludge9%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds9%
C08JWorking-up9%
C08LCompositions of macromolecular compounds9%
C09DCoating compositions, e.g. paints, varnishes or lacquers9%
C11DDetergent compositions9%
C23FNon-mechanical removal of metallic material from surface9%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1976–1984Patents assigned to TOYODA CHUO KENKYUSHO KK (2)· patent assignee history
1976Based in Nagoya, JP· patent location history
1984Patents assigned to AISHIN KAKO KK (1)· patent assignee history
1984Patents assigned to AISIN SEIKI (1)· patent assignee history
1984Based in Aichi, JP· patent location history
2021Patents assigned to NIPPON CATALYTIC CHEM IND (1)· patent assignee history
2021Based in Osaka, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOYODA CHUO KENKYUSHO KK21976–1984
AISHIN KAKO KK11984
AISIN SEIKI11984
NIPPON CATALYTIC CHEM IND12021
Locations
LocationPatentsSpan
Osaka, JP12021
Aichi, JP11984
Nagoya, JP11976