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Inventor

Suigen Kyoh

Inventor
Yokohama, JP

Overview

22→
Patents
2001–2015
Patent span
Physics
Primary field (CPC G)

Patents· 22 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices53%
G06FElectric digital data processing19%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1016%
B82YSpecific uses or applications of nanostructures6%
G06TImage data processing or generation, in general3%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests3%
PatentTitleYear
9,217,918'Photomask, photomask manufacturing apparatus, and photomask manufacturing method'20158,883,373'Method for manufacturing photo mask, method for manufacturing semiconductor device, and program'20148,728,711'Cleaning reticle, method for cleaning reticle stage, and method for manufacturing semiconductor device'20148,285,412'Semiconductor device production control method'20128,234,596'Pattern data creating method, pattern data creating program, and semiconductor device manufacturing method'20128,230,379'Layout generating method for semiconductor integrated circuits'20128,227,151'Flare correction method, method for manufacturing mask for lithography, and method for manufacturing semiconductor device'20128,118,585'Pattern formation method and a method for manufacturing a semiconductor device'20127,966,584'Pattern-producing method for semiconductor device'20117,917,871'Method and program for pattern data generation using a modification guide'20117,797,068'Defect probability calculating method and semiconductor device manufacturing method'20107,673,258'Design data creating method, design data creating program product, and manufacturing method of semiconductor device'20107,539,962'Pattern data correcting method, photo mask manufacturing method, semiconductor device manufacturing method, program and semiconductor device'20097,523,437'Pattern-producing method for semiconductor device'20097,499,582'Method for inspecting a defect in a photomask, method for manufacturing a semiconductor device and method for producing a photomask'20097,266,801'Design pattern correction method and mask pattern producing method'20077,194,704'Design layout preparing method'20077,029,799'Exposure method for forming pattern for IC chips on reticle by use of master masks'20066,635,549'Method of producing exposure mask'20036,542,237'Exposure method for making precision patterns on a substrate'20036,340,542'Method of manufacturing a semiconductor device, method of manufacturing a photomask, and a master mask'20026,319,637'Method for forming pattern'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2015Patents assigned to TOSHIBA KK (21)· patent assignee history
2001–2012Based in Yokohama, JP· patent location history
2003–2014Based in Kanagawa, JP· patent location history
2006Patents assigned to DAINIPPON PRINTING CO LTD (1)· patent assignee history
2006Based in Kawasaki, JP· patent location history
2012–2014Patents assigned to KYOH SUIGEN (7)· patent assignee history
2012–2014Patents assigned to INANAMI RYOICHI (2)· patent assignee history
2012–2014Patents assigned to NAKASUGI TETSURO (2)· patent assignee history
2014–2015Based in Nagoya, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOSHIBA KK212001–2015
KYOH SUIGENself72012–2014
INANAMI RYOICHI22012–2014
NAKASUGI TETSURO22012–2014
DAINIPPON PRINTING CO LTD12006
Locations
LocationPatentsSpan
Yokohama, JP152001–2012
Kanagawa, JP42003–2014
Nagoya, JP22014–2015
Kawasaki, JP12006