Inventor
Izuru Shinjo
Inventor
Tokyo, JP
Overview
Patents· 39 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Rprimary
G01RMeasuring electric variables27%
G01DMeasuring not specially adapted for a specific variable23%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock13%
B82YSpecific uses or applications of nanostructures7%
Y10TTechnical subjects covered by former us classification6%
G01BMeasuring length, thickness or similar linear dimensions5%
B29CShaping or joining of plastics4%
F02PIgnition, other than compression ignition, for internal-combustion engines4%
F01LCyclically operating valves for machines or engines1%
F02DControlling combustion engines1%
PatentTitleYear
7,686,651'Sensor apparatus'20107,441,322'Method of manufacturing a magnetic detection apparatus'20087,397,236'Magnetic detector'20087,117,585'Magnetic detection apparatus with resin infiltration prevention'20067,053,605'Rotation information detecting apparatus with noise suppression circuit'20067,045,997'Magnetic detection apparatus'20066,977,497'Magnetic detector'20056,937,010'Magnetic detector'20056,870,365'Rotation detecting device'20056,819,101'Magnetic detector'20046,661,221'Magnetic field sensing element and device having magnetoresistance element and integrated circuit formed on the same substrate'20036,630,821'Magnetic detection device for detecting moving direction of a toothed magnetic movable body'20036,577,122'Magnetic detection apparatus with multiple pole projection guide'20036,528,992'Magnetic detector having magnetic field sensing device centrally aligned with magnetic field generator'20036,427,316'Manufacturing method of a rotation sensor'20026,426,620'Magnetic field sensing element and device having magnetoresistance element and integrated circuit formed on the same substrate'20026,392,407'Rotation angle detecting device'20026,339,324'Rotating magnetic object motion sensor with unbalanced bias'20026,326,779'Magnetic detector having separate base and connector units and production process therefor'20016,323,644'Rotation sensor'20016,255,811'Magnetic detector with a magnetoresistive element having hysteresis'20016,246,234'Magnetic detector with improved temperature characteristic and noise resistance'20016,239,595'Magnetic field sensing element'20016,211,669'Magnetic detector with improved noise resistance characteristics'20016,204,662'Magnetic field sensing element with processing circuit and input and output side resistors formed from same metal film'20016,194,893'Magnetic detector for detecting movement of a magnetic member'20016,177,793'Magnetic detector which detects a rotational angle of a rotary member'20016,169,396'Sensing device for detecting change in an applied magnetic field achieving high accuracy by improved configuration'20016,140,813'Rotating magnetic object motion sensor with unbalanced bias'20006,111,403'Magnetic detector wherein the magnetic flux crosses the sensing elements at a predetermined angle'20006,072,311'Magnetic sensor with simplified integral construction'20006,061,895'Manufacturing method of a rotation sensor'20005,952,824'Magnetic detecting apparatus with giant magnetoresistive sensing element and level shifting waveform processing circuit'19995,821,744'Rotation sensor having a simplified and compact structure'19985,627,464'Rotation angle detecting device for a camshaft provided in an internal combustion engine'19975,621,315'Angular position detecting apparatus with noise discrimination'19975,548,996'Sensor for automobile'19965,304,963'Filter circuit for an electromagnetic pickup'19945,126,663'Hall effect sensor with a protective support device'1992Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1992–2010Patents assigned to MITSUBISHI ELECTRIC CORP (39)· patent assignee history
1992–1997Based in Himeji, JP· patent location history
1997Based in Hyogo, JP· patent location history
1998–2010Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MITSUBISHI ELECTRIC CORP | 39 | 1992–2010 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 34 | 1998–2010 |
| Himeji, JP | 4 | 1992–1997 |
| Hyogo, JP | 1 | 1997 |