Inventor

Namiko Ikegaya

Inventor

Tokya, JP

Overview

2018

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B08Bprimary

B08BCleaning in general25%

C07CAcyclic or carbocyclic compounds25%

C11DDetergent compositions25%

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices25%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2018Patents assigned to 3M INNOVATIVE PROPERTIES CO (1)· patent assignee history

2018Based in Tokya, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
3M INNOVATIVE PROPERTIES CO	1	2018

Locations

Location	Patents	Span
Tokya, JP	1	2018