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Inventor

Silvio J. Rabello

Inventor
Palo Alto, CA, US

Overview

6→
Patents
2006–2016
Patent span
Physics
Primary field (CPC G)

Patents· 6 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G01NInvestigating or analysing materials by determining their chemical or physical properties20%
B23KSoldering or unsoldering10%
G01BMeasuring length, thickness or similar linear dimensions10%
G06FElectric digital data processing10%
PatentTitleYear
9,239,523'Diffraction based overlay linearity testing'20168,817,273'Dark field diffraction based overlay'20148,525,993'Scatterometry measurement of asymmetric structures'20138,170,838'Simulating two-dimensional periodic patterns using compressed fourier space'20127,508,976'Local process variation correction for overlay measurement'20096,992,764'Measuring an alignment target with a single polarization state'2006

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2006–2016Patents assigned to NANOMETRICS INC (5)· patent assignee history
2006–2016Based in Palo Alto, CA, US· patent location history
2012–2016Patents assigned to RABELLO SILVIO J (4)· patent assignee history
2012–2016Patents assigned to LI JIE (3)· patent assignee history
2012–2013Patents assigned to MCGAHAN WILLIAM A (2)· patent assignee history
2014Patents assigned to CASAVANT THOMAS ANDRE (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NANOMETRICS INC52006–2016
RABELLO SILVIO Jself42012–2016
LI JIE32012–2016
MCGAHAN WILLIAM A22012–2013
CASAVANT THOMAS ANDRE12014
Locations
LocationPatentsSpan
Palo Alto, California, US62006–2016