Inventor
Henry Guckel
Inventor
Madison, WI, US
Overview
Patents· 29 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Lprimary
G01LMeasuring force, stress, torque, work, mechanical power, mechanical efficiency, or fluid pressure13%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests13%
Y10TTechnical subjects covered by former us classification13%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices11%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems7%
H02KDynamo-electric machines5%
H03HImpedance networks, e.g. resonant circuits3%
H10DInorganic electric semiconductor devices3%
G02BOptical elements, systems or apparatus2%
PatentTitleYear
6,607,305'Bi-directional micromechanical latching linear actuator'20036,133,615'Photodiode arrays having minimized cross-talk between diodes'20006,087,743'Position control system for use with micromechanical actuators'20005,908,719'Radiation mask adapted to be aligned with a photoresist layer and method of making the same'19995,866,281'Alignment method for multi-level deep x-ray lithography utilizing alignment holes and posts'19995,808,384'Single coil bistable, bidirectional micromechanical actuator'19985,718,618'Lapping and polishing method and apparatus for planarizing photoresist and metal microstructure layers'19985,679,502'Method and apparatus for micromachining using hard X-rays'19975,644,177'Micromechanical magnetically actuated devices'19975,576,147'Formation of microstructures using a preformed photoresist sheet'19965,559,358'Opto-electro-mechanical device or filter, process for making, and sensors made therefrom'19965,496,668'Formation of microstructures using a preformed photoresist sheet'19965,378,583'Formation of microstructures using a preformed photoresist sheet'19955,357,807'Micromachined differential pressure transducers'19945,327,033'Micromechanical magnetic devices'19945,206,983'Method of manufacturing micromechanical devices'19935,189,777'Method of producing micromachined differential pressure transducers'19935,190,637'Formation of microstructures by multiple level deep X-ray lithography with sacrificial metal layers'19935,188,983'Polysilicon resonating beam transducers and method of producing the same'19935,090,254'Polysilicon resonating beam transducers'19925,013,693'Formation of microstructures with removal of liquid by freezing and sublimation'19914,996,082'Sealed cavity semiconductor pressure transducers and method of producing the same'19914,897,360'Polysilicon thin film process'19904,853,669'Sealed cavity semiconductor pressure transducers and method of producing the same'19894,744,863'Sealed cavity semiconductor pressure transducers and method of producing the same'19884,658,279'Velocity saturated strain sensitive semiconductor devices'19874,234,361'Process for producing an electrostatically deformable thin silicon membranes utilizing a two-stage diffusion step to form an etchant resistant layer'19804,203,128'Electrostatically deformable thin silicon membranes'19804,180,771'Chemical-sensitive field-effect transistor'1979Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1979Patents assigned to AIRCO INC (1)· patent assignee history
1979–2003Based in Madison, WI, US· patent location history
1980–2003Patents assigned to WISCONSIN ALUMNI RES FOUND (27)· patent assignee history
1996Patents assigned to HONEYWELL INC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| WISCONSIN ALUMNI RES FOUND | 27 | 1980–2003 |
| AIRCO INC | 1 | 1979 |
| HONEYWELL INC | 1 | 1996 |
Locations
| Location | Patents | Span |
|---|---|---|
| Madison, WI, US | 29 | 1979–2003 |