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Inventor

Keisuki Washio

Inventor
Okayama, JP

Overview

1→
Patents
2013
Patent span
Chemistry
Primary field (CPC C)

Patents· 1 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C23Cprimary
C23CCoating metallic material50%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1050%
PatentTitleYear
8,440,268'Method and apparatus for growing plasma atomic layer'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013Patents assigned to HATTORI NOZOMU (1)· patent assignee history
2013Patents assigned to MITSUI SHIPBUILDING ENG (1)· patent assignee history
2013Patents assigned to MIYATAKE NAOMASA (1)· patent assignee history
2013Patents assigned to MURATA KAZUTOSHI (1)· patent assignee history
2013Patents assigned to TACHIBANA HIROYUKI (1)· patent assignee history
2013Based in Okayama, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HATTORI NOZOMU12013
MITSUI SHIPBUILDING ENG12013
MIYATAKE NAOMASA12013
MURATA KAZUTOSHI12013
TACHIBANA HIROYUKI12013
Locations
LocationPatentsSpan
Okayama, JP12013