Inventor
Paul Graeupner
Inventor
Aalen, DE
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices63%
G02BOptical elements, systems or apparatus19%
G01MTesting static or dynamic balance of machines or structures6%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them6%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%
PatentTitleYear
9,885,958'Projection exposure methods and systems'20189,690,203'Method for adjusting an illumination setting'20178,917,379'Projection exposure methods and systems'20148,711,330'Lithographic apparatus and device manufacturing method'20148,605,257'Projection system with compensation of intensity variations and compensation element therefor'20138,416,390'Illumination system for illuminating a mask in a microlithographic exposure apparatus'20138,405,907'Method for correcting optical proximity effects'20138,237,915'Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus'20128,027,091'Method for correcting optical proximity effects'20117,961,293'Lithographic apparatus and device manufacturing method'20117,800,732'Projection exposure method and projection exposure apparatus for microlithography'20107,649,702'Immersion lithography objective'20107,570,345'Method of optimizing imaging performance'20097,352,435'Lithographic apparatus and device manufacturing method'20087,310,187'Projection objective, especially for microlithography, and method for adjusting a projection objective'20077,233,386'Method of optimizing imaging performance'20077,227,616'Method for improving an optical imaging property of a projection objective of a microlithographic projection exposure apparatus'20077,209,292'Projection objective, especially for microlithography, and method for adjusting a projection objective'20077,209,241'Method for determining wavefront aberrations'20077,019,846'Method for determining wavefront aberrations'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2014Patents assigned to ZEISS CARL SMT AG (11)· patent assignee history
2006–2018Based in Aalen, DE· patent location history
2008–2014Patents assigned to ASML NETHERLANDS BV (4)· patent assignee history
2011–2018Patents assigned to ZEISS CARL SMT GMBH (9)· patent assignee history
2012–2014Patents assigned to GRAEUPNER PAUL (6)· patent assignee history
2014Patents assigned to BASELMANS JOHANNES JACOBUS MATHEUS (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ZEISS CARL SMT AG | 11 | 2006–2014 |
| ZEISS CARL SMT GMBH | 9 | 2011–2018 |
| GRAEUPNER PAULself | 6 | 2012–2014 |
| ASML NETHERLANDS BV | 4 | 2008–2014 |
| BASELMANS JOHANNES JACOBUS MATHEUS | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Aalen, DE | 20 | 2006–2018 |