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Inventor

Akira Oozono

Inventor
Kumamoto, JP

Overview

2→
Patents
2009–2010
Patent span
Performing operations
Primary field (CPC B)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B08Bprimary
B08BCleaning in general33%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices33%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1033%
PatentTitleYear
7,736,498'Solution treatment apparatus and solution treatment method'20107,547,614'Solution treatment apparatus and solution treatment method'2009

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2009–2010Patents assigned to TOKYO ELECTRON LTD (2)· patent assignee history
2009–2010Based in Kumamoto, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD22009–2010
Locations
LocationPatentsSpan
Kumamoto, JP22009–2010