Inventor

Li Zhang

Inventor
Belmont, MA, US

Overview

18→
Patents
1996–2021
Patent span
Performing operations
Primary field (CPC B)

Patents· 18 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

B01Dprimary
B01DSeparation17%
C02FTreatment of water, waste water, sewage, or sludge15%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry12%
A23CDairy products, e.g. milk, butter or cheese8%
C01BNon-metallic elements8%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices4%
C22CAlloys2%
D02GCrimping or curling fibres, filaments, threads, or yarns2%
D06PDyeing or printing textiles2%
D10BIndexing scheme associated with sublasses of section d, relating to textiles2%
PatentTitleYear
11,104,978Alloy for seal ring, seal ring, and method of making seal ring for seal assembly of machine202111,049,002Neural network computation device and method2021D0922949Charger for dust mite controller202111,031,465Semiconductor device incorporating epitaxial layer field stop zone202111,020,702Simultaneous reaction system and method for organic material pyrolysis and combustion202111,022,260Lighting apparatus with a light module with elongated housing and a base bracket holding the elongated housing202111,015,976Method for constructing meshed model and discrete chromatography of eight-element primary color HSB full color gamut color space20219,765,453'Spinning, cheese dyeing, knitting and weaving process of a high performance flame-resistant modacrylic/cotton safety apparel fabric'20178,921,013'System and method for test pattern for lithography process'20148,524,062'Electrodeionization device and method with improved scaling resistance'20138,501,376'System and method for test pattern for lithography process'20138,142,633'Electrodialysis system and process'20127,591,933'Spiral electrodeionization device with segregated ionic flows'20097,306,709'Spiral electrodeionization device with flow distribution profiling'20076,126,805'Electrodialysis including filled cell electrodialysis (electrodeionization)'20005,814,197'Electrodialysis including filled cell electrodialysis (electrodeionization)'19985,679,228'Electrodialysis including filled cell electrodialysis (electrodeionization)'19975,503,729'Electrodialysis including filled cell electrodialysis (electrodeionization)'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–2000Patents assigned to IONICS (4)· patent assignee history
1996–2000Based in Acton, MA, US· patent location history
2007–2013Based in Belmont, MA, US· patent location history
2009–2012Patents assigned to GE IONICS INC (2)· patent assignee history
2012–2013Patents assigned to ZHANG LI (2)· patent assignee history
2013–2014Patents assigned to SEMICONDUCTOR MFG INT SHANGHAI (2)· patent assignee history
2013–2014Based in Shanghai, CN· patent location history
2021Patents assigned to ALPHA & OMEGA SEMICONDUCTOR CAYMAN LTD (1)· patent assignee history
2021Based in Dunlap, IL, US· patent location history
2021Based in Pudong, CN· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
IONICS41996–2000
GE IONICS INC22009–2012
SEMICONDUCTOR MFG INT SHANGHAI22013–2014
ZHANG LIself22012–2013
ALPHA & OMEGA SEMICONDUCTOR CAYMAN LTD12021
Locations
LocationPatentsSpan
Belmont, Massachusetts, US42007–2013
Acton, Massachusetts, US41996–2000
Shanghai, CN22013–2014
Dunlap, Illinois, US12021
Pudong, CN12021