Inventor
Akio Hashizume
Inventor
Kyoto, JP
Overview
Patents· 20 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
H01LSemiconductor devices16%
B08BCleaning in general11%
B44CProducing decorative effects8%
B05CApparatus for applying fluent materials to surfaces, in general5%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests5%
B01FMixing, e.g. dissolving, emulsifying or dispersing3%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices3%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h103%
A46BBrushes2%
PatentTitleYear
10,835,932Substrate processing apparatus and substrate processing method202010,821,483Substrate treatment apparatus202010,665,479Substrate treatment device and substrate treatment method202010,497,581Substrate processing device20199,899,240'Substrate treatment apparatus'20189,867,123'Wireless communication apparatus and wireless communication method'20189,364,873'Substrate treatment method and substrate treatment apparatus'20169,293,352'Substrate processing method'20168,883,653'Substrate treatment method and substrate treatment apparatus'20148,883,026'Substrate processing method and substrate processing apparatus'20148,877,653'Substrate processing method and substrate processing apparatus'20148,821,741'Substrate processing method and substrate processing apparatus'20148,501,025'Substrate treatment apparatus and substrate treatment method'20137,959,820'Substrate processing method and substrate processing apparatus'20117,838,206'Substrate processing method and substrate processing apparatus'20107,682,456'Substrate treatment method and substrate treatment apparatus'20107,422,641'Substrate cleaning apparatus and substrate cleaning method'20087,418,970'Substrate processing apparatus for drying substrate'20087,314,529'Substrate cleaning apparatus and substrate cleaning method'20084,788,883'Rotor for a driving device'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988Patents assigned to HASHIZUME YASUYOSHI (1)· patent assignee history
1988Based in Tokyo, JP· patent location history
2008–2018Patents assigned to DAINIPPON SCREEN MFG (12)· patent assignee history
2008–2020Based in Kyoto, JP· patent location history
2013–2016Patents assigned to HASHIZUME AKIO (3)· patent assignee history
2013–2016Patents assigned to AKANISHI YUYA (2)· patent assignee history
2014–2020Patents assigned to SCREEN HOLDINGS CO LTD (10)· patent assignee history
2018Based in Shijonawate, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| DAINIPPON SCREEN MFG | 12 | 2008–2018 |
| SCREEN HOLDINGS CO LTD | 10 | 2014–2020 |
| HASHIZUME AKIOself | 3 | 2013–2016 |
| AKANISHI YUYA | 2 | 2013–2016 |
| HASHIZUME YASUYOSHI | 1 | 1988 |
Locations
| Location | Patents | Span |
|---|---|---|
| Kyoto, JP | 18 | 2008–2020 |
| Shijonawate, JP | 1 | 2018 |
| Tokyo, JP | 1 | 1988 |