LexDanaLexDanabeta
Inventor

Tsutomu Hayakawa

Inventor
Tokyo, JP

Overview

15→
Patents
1988–2011
Patent span
Electricity
Primary field (CPC H)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Bprimary
H10BElectronic memory devices24%
H10NElectric solid-state devices not otherwise provided for21%
H10DInorganic electric semiconductor devices11%
G11CStatic stores8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests8%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
F01KSteam engine plants3%
F02GHot gas or combustion-product positive-displacement engine plants3%
F16JPistons3%
PatentTitleYear
7,919,767'Semiconductor memory device and fabrication method thereof'20117,755,075'Phase-change memory device with minimized reduction in thermal efficiency and method of manufacturing the same'20107,728,321'Phase change memory device and method of manufacturing the device'20107,723,717'Semiconductor memory device and fabrication method thereof'20107,671,360'Semiconductor device and method of producing the same'20107,532,507'Phase change memory device and method for manufacturing phase change memory device'20097,498,601'Phase-change memory device and method of manufacturing same'20097,368,802'Phase-change memory device and method of manufacturing same'20086,948,319'Cogeneration device'20056,861,319'Gate electrode and method of fabricating the same'20056,723,608'Method for manufacturing a semiconductor device having a layered gate electrode'20046,278,151'Semiconductor device having wiring detour around step'20015,902,717'Method of fabricating semiconductor device using half-tone phase shift mask'19995,789,789'Semiconductor device and manufacturing method for improved voltage resistance between an N-well and N-type diffusion layer'19984,728,111'Compressed asbestos sheet gasket which swells in presence of liquids'1988

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1988Patents assigned to ASAHI ASBESTOS CO (1)· patent assignee history
1988Based in Yamanashi, JP· patent location history
1998–2001Patents assigned to NEC CORP (3)· patent assignee history
1998–2011Based in Tokyo, JP· patent location history
2004–2011Patents assigned to ELPIDA MEMORY INC (9)· patent assignee history
2005Patents assigned to HONDA MOTOR CO LTD (1)· patent assignee history
2005Based in Saitama, JP· patent location history
2008–2009Based in Chuo-ku, JP· patent location history
2010Patents assigned to ELIPIDA MEMORY INC (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ELPIDA MEMORY INC92004–2011
NEC CORP31998–2001
ASAHI ASBESTOS CO11988
ELIPIDA MEMORY INC12010
HONDA MOTOR CO LTD12005
Locations
LocationPatentsSpan
Tokyo, JP101998–2011
Chuo-ku, JP32008–2009
Saitama, JP12005
Yamanashi, JP11988