Inventor

Wouter Onno Pril

Inventor
Eindhoven, NL

Overview

11→
Patents
2004–2020
Patent span
Physics
Primary field (CPC G)

Patents· 11 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices50%
G01BMeasuring length, thickness or similar linear dimensions10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
B23DPlaning5%
C01BNon-metallic elements5%
G01DMeasuring not specially adapted for a specific variable5%
G06KGraphical data reading5%
G06TImage data processing or generation, in general5%
G06VImage or video recognition or understanding5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2004–2020Patents assigned to ASML NETHERLANDS BV (10)· patent assignee history
2004–2009Based in Eindhoven, NL· patent location history
2015Patents assigned to PADIY ALEXANDER VIKTOROVYCH (1)· patent assignee history
2015Patents assigned to PRIL WOUTER ONNO (1)· patent assignee history
2015Patents assigned to TEL WIM TJIBBO (1)· patent assignee history
2015Patents assigned to THEEUWES THOMAS (1)· patent assignee history
2015–2020Based in Geldrop, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
ASML NETHERLANDS BV102004–2020
PADIY ALEXANDER VIKTOROVYCH12015
PRIL WOUTER ONNOself12015
TEL WIM TJIBBO12015
THEEUWES THOMAS12015
Locations
LocationPatentsSpan
Eindhoven, NL92004–2009
Geldrop, NL22015–2020