Inventor

Mitsuyoshi Ochiai

Inventor

Osaka, JP

Overview

2013–2018

Patent span

Chemistry

Primary field (CPC C)

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices31%

C07CAcyclic or carbocyclic compounds17%

C07DHeterocyclic compounds14%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds14%

C08KUse of inorganic or non-macromolecular organic substances as compounding ingredients8%

C08LCompositions of macromolecular compounds8%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h106%

B60NSeats specially adapted for vehicles3%

PatentTitleYear

Assembled from patent assignee/location history and declaration credentials.

2013–2018Patents assigned to SUMITOMO CHEMICAL CO (11)· patent assignee history

2013–2016Patents assigned to ICHIKAWA KOJI (6)· patent assignee history

2013–2016Patents assigned to OCHIAI MITSUYOSHI (6)· patent assignee history

2013–2014Patents assigned to HIRAOKA TAKASHI (3)· patent assignee history

2013–2016Patents assigned to SUGIHARA MASAKO (2)· patent assignee history

2013–2018Based in Osaka, JP· patent location history

2013–2016Based in Ibaraki, JP· patent location history

2018Based in Aichi, JP· patent location history

Assignee and location history derived from the patent record.

Assignees

Locations