Inventor
Kenichi Iguchi
Inventor
Matsumoto, JP
Overview
Patents· 22 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices31%
H01LSemiconductor devices28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1026%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
A23DEdible oils or fats, e.g. margarines, shortenings or cooking oils2%
B23KSoldering or unsoldering2%
C07HSugars2%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
PatentTitleYear
11,069,779Silicon carbide semiconductor device and method for manufacturing the same202110,928,246Optical measuring device comprising light receiving regions of light guide members overlap with each other in an integrator202110,727,060Doping system, doping method and method for manufacturing silicon carbide semiconductor device202010,658,183Impurity adding apparatus, impurity adding method, and semiconductor element manufacturing method202010,559,664Method of manufacturing semiconductor device by removing a bulk layer to expose an epitaxial-growth layer and by removing portions of a supporting-substrate to expose portions of the epitaxial-growth layer202010,453,687Method of manufacturing semiconductor device201910,109,501Manufacturing method of semiconductor device having a voltage resistant structure20189,972,499Method for forming metal-semiconductor alloy using hydrogen plasma20189,892,919'Semiconductor device manufacturing method'20189,825,145'Method of manufacturing silicon carbide semiconductor device including forming an electric field control region by a laser doping technology'20179,786,749'Semiconductor device having a voltage resistant structure'20179,779,968'Method for processing semiconductor substrate and method for manufacturing semiconductor device in which said processing method is used'20179,716,008'Apparatus for doping impurities, method for doping impurities, and method for manufacturing semiconductor device'20179,659,774'Impurity introducing method, impurity introducing apparatus, and method of manufacturing semiconductor element'20179,659,775'Method for doping impurities, method for manufacturing semiconductor device'20179,577,032'Semiconductor device'20179,564,334'Method of manufacturing a semiconductor device'20179,548,205'Method of manufacturing a semiconductor device'20179,355,858'Method of manufacturing semiconductor device'20168,604,584'Semiconductor device and method of manufacturing semiconductor device'20138,278,682'Semiconductor device'20125,846,593'Food materials containing sesaminol triglucoside derived from sesame seeds'1998Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1998Patents assigned to CORUNUM CORP (1)· patent assignee history
1998Based in Osaka, JP· patent location history
2012–2021Patents assigned to FUJI ELECTRIC CO LTD (20)· patent assignee history
2012–2013Patents assigned to IGUCHI KENICHI (2)· patent assignee history
2012–2013Patents assigned to YOSHIKAWA KOH (2)· patent assignee history
2012–2021Based in Matsumoto, JP· patent location history
2017–2018Patents assigned to OCTEC INC (2)· patent assignee history
2017–2019Based in Nagano, JP· patent location history
2017–2018Based in Kawasaki, JP· patent location history
2021Based in Hamamatsu, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| FUJI ELECTRIC CO LTD | 20 | 2012–2021 |
| IGUCHI KENICHIself | 2 | 2012–2013 |
| OCTEC INC | 2 | 2017–2018 |
| YOSHIKAWA KOH | 2 | 2012–2013 |
| CORUNUM CORP | 1 | 1998 |
Locations
| Location | Patents | Span |
|---|---|---|
| Matsumoto, JP | 12 | 2012–2021 |
| Nagano, JP | 5 | 2017–2019 |
| Kawasaki, JP | 3 | 2017–2018 |
| Hamamatsu, JP | 1 | 2021 |
| Osaka, JP | 1 | 1998 |