Inventor
John E. Madocks
Inventor
Tucson, AZ, US
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps41%
C23CCoating metallic material18%
H05HPlasma technique16%
F03HProducing a reactive propulsive thrust, not otherwise provided for5%
F16KValves5%
A61BDiagnosis2%
F04BPositive-displacement machines for liquids2%
F16LPipes2%
F16MFrames, casings or beds of engines, machines or apparatus, not specific to engines, machines or apparatus provided for elsewhere2%
F21VFunctional features or details of lighting devices or systems thereof2%
PatentTitleYear
11,092,245Chamber valve202110,989,343Push-to-connect and pull-to-disconnect quick coupling202110,811,236Magnetic anode for sputter magnetron cathode202010,657,932Tuning device for stringed musical instrument202010,273,570Rotary magnetron magnet bar and apparatus containing the same for high target utilization201910,134,557Linear anode layer slit ion source20189,388,490'Rotary magnetron magnet bar and apparatus containing the same for high target utilization'20169,136,086'Closed drift magnetic field ion source apparatus containing self-cleaning anode and a process for substrate modification therewith'20159,103,018'Sputtering target temperature control utilizing layers having predetermined emissivity coefficients'20158,535,490'Rotatable magnetron sputtering with axially movable target electrode tube'20138,304,744'Closed drift ion source'20127,993,496'Cylindrical target with oscillating magnet for magnetron sputtering'20117,932,678'Magnetic mirror plasma source and method using same'20117,411,352'Dual plasma beam sources and method'20087,327,089'Beam plasma source'20087,294,283'Penning discharge plasma source'20077,259,378'Closed drift ion source'20077,038,389'Magnetron plasma source'20067,025,833'Apparatus and method for web cooling in a vacuum coating chamber'20067,023,128'Dipole ion source'20066,919,672'Closed drift ion source'20056,911,779'Magnetic mirror plasma source'20054,949,927'Articulable column'19904,850,806'Controlled by-pass for a booster pump'19894,753,417'Gate valve for vacuum processing apparatus'1988Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1988–1989Patents assigned to BOC GROUP INC (2)· patent assignee history
1989–1990Based in Oakland, CA, US· patent location history
1990–2015Patents assigned to MADOCKS JOHN (3)· patent assignee history
2005–2008Patents assigned to APPLIED PROCESS TECHNOLOGIES I (8)· patent assignee history
2005–2021Based in Tucson, AZ, US· patent location history
2006Based in Tuscon, AZ, US· patent location history
2011–2016Patents assigned to GEN PLASMA INC (7)· patent assignee history
2016–2019Based in Ashfield, MA, US· patent location history
2018–2021Patents assigned to GENERAL PLASMA INC (5)· patent assignee history
2020Based in Shelburne Falls, MA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| APPLIED PROCESS TECHNOLOGIES I | 8 | 2005–2008 |
| GEN PLASMA INC | 7 | 2011–2016 |
| GENERAL PLASMA INC | 5 | 2018–2021 |
| MADOCKS JOHNself | 3 | 1990–2015 |
| BOC GROUP INC | 2 | 1988–1989 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tucson, AZ, US | 18 | 2005–2021 |
| Ashfield, Massachusetts, US | 2 | 2016–2019 |
| Oakland, California, US | 2 | 1989–1990 |
| Shelburne Falls, Massachusetts, US | 1 | 2020 |
| Tuscon, AZ, US | 1 | 2006 |