Inventor
Koichi Kosaka
Inventor
Tokyo, JP
Overview
Patents· 3 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
D06Fprimary
D06FLaundering, drying, ironing, pressing or folding textile articles50%
B24BMachines, devices, or processes for grinding or polishing25%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
PatentTitleYear
8,569,148'Final polishing method for silicon single crystal wafer and silicon single crystal wafer'20135,511,264'Method for deodorizing and refreshing for dry cleaning'19965,488,842'Method for deodorizing and refreshing for dry cleaning and dry cleaning apparatus using such method'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996Patents assigned to EBARA CORP (2)· patent assignee history
1996Based in Tokyo, JP· patent location history
2013Patents assigned to IIZUKA NAOTO (1)· patent assignee history
2013Patents assigned to KOSAKA KOICHI (1)· patent assignee history
2013Patents assigned to KURIMOTO HIROTAKA (1)· patent assignee history
2013Patents assigned to MARUYAMA FUMIAKI (1)· patent assignee history
2013Based in Chikuma, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| EBARA CORP | 2 | 1996 |
| IIZUKA NAOTO | 1 | 2013 |
| KOSAKA KOICHIself | 1 | 2013 |
| KURIMOTO HIROTAKA | 1 | 2013 |
| MARUYAMA FUMIAKI | 1 | 2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Tokyo, JP | 2 | 1996 |
| Chikuma, JP | 1 | 2013 |