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Inventor

Kazuyoshi Yaguchi

Inventor
Tokyo, JP

Overview

3→
Patents
2013–2014
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1038%
B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems13%
C09KMaterials for miscellaneous applications, not provided for elsewhere13%
C23FNon-mechanical removal of metallic material from surface13%
H01LSemiconductor devices13%
H10DInorganic electric semiconductor devices13%
PatentTitleYear
8,883,652'Silicon etching liquid and etching method'20148,658,053'Etching composition for metal material and method for manufacturing semiconductor device by using same'20148,562,855'Silicon etching liquid and etching method'2013

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2013–2014Patents assigned to MITSUBISHI GAS CHEMICAL CO (3)· patent assignee history
2013–2014Patents assigned to YAGUCHI KAZUYOSHI (3)· patent assignee history
2013–2014Patents assigned to SOTOAKA RYUJI (2)· patent assignee history
2013–2014Based in Tokyo, JP· patent location history
2014Patents assigned to ABE KOJIRO (1)· patent assignee history
2014Patents assigned to OHTO MASARU (1)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
MITSUBISHI GAS CHEMICAL CO32013–2014
YAGUCHI KAZUYOSHIself32013–2014
SOTOAKA RYUJI22013–2014
ABE KOJIRO12014
OHTO MASARU12014
Locations
LocationPatentsSpan
Tokyo, JP32013–2014