Inventor

Cha Won Koh

Inventor

Yongin-si, KR

Overview

1999–2020

Patent span

Electricity

Primary field (CPC H)

Patents· 53 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices27%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%

H01LSemiconductor devices8%

H10BElectronic memory devices7%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests7%

C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds6%

H10DInorganic electric semiconductor devices4%

C07CAcyclic or carbocyclic compounds4%

C07DHeterocyclic compounds2%

PatentTitleYear

10,797,056Semiconductor device and method of manufacturing the same2020 10,688,437Filter structure for chemical solution used in manufacturing integrated circuit and apparatus for supplying chemical solution including filter structure for chemical solution2020 10,586,798Semiconductor device and method of manufacturing the same2020 10,438,810Method of forming photoresist pattern and method of fabricating semiconductor device using the same2019 10,345,701Photoresist polymers, photoresist compositions, methods of forming patterns and methods of manufacturing semiconductor devices2019 9,842,852'Methods of forming patterns using photoresist polymers and methods of manufacturing semiconductor devices'2017 9,772,555'Methods of forming patterns using photoresists'2017 9,520,289'Methods of forming a pattern of a semiconductor device'2016 9,482,953'Lithography apparatus having effective thermal electron enhancement unit and method of forming pattern using the same'2016 9,412,604'Methods of manufacturing semiconductor device'2016 9,147,687'Methods of fabricating semiconductor devices'2015 8,999,840'Method of forming fine patterns of semiconductor device'2015 8,557,131'Methods of forming fine patterns and methods of fabricating semiconductor devices'2013 8,278,221'Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same'2012 8,003,543'Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same'2011 7,998,874'Method for forming hard mask patterns having a fine pitch and method for forming a semiconductor device using the same'2011 7,892,982'Method for forming fine patterns of a semiconductor device using a double patterning process'2011 7,862,988'Method for forming patterns of semiconductor device'2011 7,842,451'Method of forming pattern'2010 7,787,301'Flash memory device using double patterning technology and method of manufacturing the same'2010 7,732,341'Method of forming a hard mask and method of forming a fine pattern of semiconductor device using the same'2010 7,723,702'E-beam lithography system for synchronously irradiating a plurality of photomasks and method of fabricating photomasks using the same'2010 7,687,369'Method of forming fine metal patterns for a semiconductor device using a damascene process'2010 7,678,650'Nonvolatile memory device and method of manufacturing the same'2010 7,582,899'Semiconductor device having overlay measurement mark and method of fabricating the same'2009 7,575,855'Method of forming pattern'2009 7,560,768'Nonvolatile memory device and method of manufacturing the same'2009 7,540,970'Methods of fabricating a semiconductor device'2009 7,452,825'Method of forming a mask structure and method of forming a minute pattern using the same'2008 7,387,869'Method of forming pattern for semiconductor device'2008 7,329,477'Process for forming a fine pattern using a top-coating composition for a photoresist and product formed by same'2008 6,984,482'Top-coating composition for photoresist and process for forming fine pattern using the same'2006 6,858,371'Maleimide-photoresist monomers containing halogen, polymers thereof and photoresist compositions comprising the same'2005 6,833,326'Method for forming fine patterns in semiconductor device'2004 6,770,415'Photoresist polymer for top-surface imaging process by silylation and photoresist composition containing the same'2004 6,764,806'Over-coating composition for photoresist, and processes for forming photoresist patterns using the same'2004 6,699,644'Process for forming a photoresist pattern comprising alkaline treatment'2004 6,664,031'Process for forming photoresist pattern by using gas phase amine treatment'2003 6,630,281'Photoresist composition for top-surface imaging processes by silylation'2003 6,627,378'Photoresist composition for top-surface imaging process by silylation'2003 6,610,616'Method for forming micro-pattern of semiconductor device'2003 6,599,844'Method and forming fine patterns of semiconductor devices using passivation layers'2003 6,586,619'Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same'2003 6,410,670'Photoresist monomer having hydroxy group and carboxy group, copolymer thereof and photoresist composition using the same'2002 6,399,272'Phenylenediamine derivative-type additive useful for a chemically amplified photoresist'2002 6,387,589'Photoresist polymers and photoresist compositions containing the same'2002 6,368,771'Photoresist polymers and photoresist compositions containing the same'2002 6,348,296'Copolymer resin, preparation thereof, and photoresist using the same'2002 6,235,447'Photoresist monomers, polymers thereof, and photoresist compositions containing the same'2001 6,200,731'Photoresist cross-linking monomers, photoresist polymers and photoresist compositions comprising the same'2001 6,087,065'Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same'2000 6,017,676'Photoresist composition comprising a copolymer resin'2000 5,888,698'Photoresist film for deep ultra violet and method for forming photoresist film pattern using the same'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999–2004Patents assigned to HYUNDAI ELECTRONICS IND (15)· patent assignee history

1999–2003Based in Ichon-shi, KR· patent location history

2001–2003Based in Kyungki-do, KR· patent location history

2002–2008Based in Seoul, KR· patent location history

2003–2008Patents assigned to HYNIX SEMICONDUCTOR INC (8)· patent assignee history

2008–2020Patents assigned to SAMSUNG ELECTRONICS CO LTD (30)· patent assignee history

2008–2020Based in Yongin-si, KR· patent location history

2012–2017Patents assigned to KOH CHA-WON (4)· patent assignee history

2015–2017Patents assigned to KIM HYUN-WOO (2)· patent assignee history

2016Based in Gyeonggi-do, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
SAMSUNG ELECTRONICS CO LTD	30	2008–2020
HYUNDAI ELECTRONICS IND	15	1999–2004
HYNIX SEMICONDUCTOR INC	8	2003–2008
KOH CHA-WONself	4	2012–2017
KIM HYUN-WOO	2	2015–2017

Locations

Location	Patents	Span
Yongin-si, KR	29	2008–2020
Seoul, KR	10	2002–2008
Kyungki-do, KR	9	2001–2003
Ichon-shi, KR	4	1999–2003
Gyeonggi-do, KR	1	2016