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Inventor

Daisuke Urayama

Inventor
Miyagi, JP

Overview

3→
Patents
2017–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 3 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Lprimary
H01LSemiconductor devices23%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1023%
H01JElectric discharge tubes or discharge lamps15%
H10NElectric solid-state devices not otherwise provided for15%
C23FNon-mechanical removal of metallic material from surface8%
H05HPlasma technique8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
PatentTitleYear
10,923,329Substrate processing apparatus and substrate processing method202110,825,688Method for etching copper layer20209,660,182'Plasma processing method and plasma processing apparatus'2017

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2017–2021Patents assigned to TOKYO ELECTRON LTD (3)· patent assignee history
2017–2021Based in Miyagi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
TOKYO ELECTRON LTD32017–2021
Locations
LocationPatentsSpan
Miyagi, JP32017–2021