Inventor
Mark Oskotsky
Inventor
Mamaroneck, NY, US
Overview
Patents· 25 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G02Bprimary
G02BOptical elements, systems or apparatus41%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices32%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light8%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them8%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h105%
G01BMeasuring length, thickness or similar linear dimensions3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
PatentTitleYear
10,859,798Wide field of view F-theta lens202010,782,509Orthoscopic projection lens202010,620,408Compact orthoscopic VNIR/SWIR lens202010,345,144Compact and athermal VNIR/SWIR spectrometer20199,372,115'Airborne hyperspectral scanning system with reflective telecentric relay'20169,297,987'Wide field athermalized orthoscopic lens system'20168,867,140'Low distortion athermalized imaging lens'20148,817,392'Wide field athermalized orthoscopic lens system'20148,462,439'Athermal apochromatic telecentric F-theta lens with low F-number'20137,944,559'Airborne hyperspectral imaging system'20117,834,979'Off-axis catadioptric projection optical system for lithography'20107,768,642'Wide field compact imaging catadioptric spectrometer'20107,511,798'Off-axis catadioptric projection optical system for lithography'20097,317,583'High numerical aperture projection system and method for microlithography'20087,271,965'Wideband apochromatic lens system'20077,187,430'Advanced illumination system for use in microlithography'20077,110,082'Optical system for maskless lithography'20067,023,525'Imaging apparatus'20066,813,003'Advanced illumination system for use in microlithography'20046,778,257'Imaging apparatus'20046,775,069'Advanced illumination system for use in microlithography'20046,741,362'Method, system, and computer program product for determining refractive index distribution'20046,307,682'Zoom illumination system for use in photolithography'20015,724,122'Illumination system having spatially separate vertical and horizontal image planes for use in photolithography'19985,631,721'Hybrid illumination system for use in photolithography'1997Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1997Based in Marmaroneck, NY, US· patent location history
1998–2020Based in Mamaroneck, NY, US· patent location history
2004–2009Patents assigned to ASML HOLDING NV (6)· patent assignee history
2004–2010Patents assigned to ASML NETHERLANDS BV (3)· patent assignee history
2007–2011Patents assigned to BAE SYSTEMS INFORMATION (3)· patent assignee history
2007Based in Mamroneck, NY, US· patent location history
2010Based in Veldhoven, NL· patent location history
2013–2020Patents assigned to BAE SYS INF & ELECT SYS INTEG (9)· patent assignee history
2013–2014Patents assigned to KORWAN DAVID J (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| BAE SYS INF & ELECT SYS INTEG | 9 | 2013–2020 |
| ASML HOLDING NV | 6 | 2004–2009 |
| ASML NETHERLANDS BV | 3 | 2004–2010 |
| BAE SYSTEMS INFORMATION | 3 | 2007–2011 |
| KORWAN DAVID J | 2 | 2013–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mamaroneck, New York, US | 22 | 1998–2020 |
| Veldhoven, NL | 1 | 2010 |
| Mamroneck, New York, US | 1 | 2007 |
| Marmaroneck, New York, US | 1 | 1997 |