Inventor

Jie Cheng

Inventor
Edison, NJ, US

Overview

8→
Patents
2010–2021
Patent span
Chemistry
Primary field (CPC C)

Patents· 8 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C10Mprimary
C10MLubricating compositions24%
C10NIndexing scheme associated with subclass c10m relating to lubricating compositions24%
A61CDentistry10%
C07CAcyclic or carbocyclic compounds10%
G06FElectric digital data processing10%
A61PSpecific therapeutic activity of chemical compounds or medicinal preparations5%
C07DHeterocyclic compounds5%
G06TImage data processing or generation, in general5%
G16HHealthcare informatics, i.e. information and communication technology [ict] specially adapted for the handling or processing of medical or healthcare data5%
G16ZInformation and communication technology [ict] specially adapted for specific application fields, not otherwise provided for5%

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2010Based in Shanghai, CN· patent location history
2012–2014Patents assigned to CHENG JIE (5)· patent assignee history
2012–2014Patents assigned to EMERT JACOB (5)· patent assignee history
2012–2014Patents assigned to INFINEUM INT LTD (5)· patent assignee history
2012–2014Based in Edison, NJ, US· patent location history
2013–2014Patents assigned to ROWLAND ROBERT G (2)· patent assignee history
2021Patents assigned to ALIGN TECHNOLOGY INC (2)· patent assignee history
2021Based in San Jose, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHENG JIEself52012–2014
EMERT JACOB52012–2014
INFINEUM INT LTD52012–2014
ALIGN TECHNOLOGY INC22021
ROWLAND ROBERT G22013–2014
Locations
LocationPatentsSpan
Edison, New Jersey, US52012–2014
San Jose, California, US22021
Shanghai, CN12010