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Inventor

Shigeru Nakamoto

Inventor
Tokyo, JP

Overview

19→
Patents
2003–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 19 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps28%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1028%
H01LSemiconductor devices16%
G05BControl or regulating systems in general8%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h106%
G01BMeasuring length, thickness or similar linear dimensions4%
G06FElectric digital data processing4%
Y02PClimate change mitigation technologies in the production or processing of goods4%
G01NInvestigating or analysing materials by determining their chemical or physical properties2%
PatentTitleYear
10,872,774Plasma processing apparatus and plasma processing method202010,783,220Data processing method, data processing apparatus and processing apparatus202010,615,010Plasma processing apparatus, data processing apparatus and data processing method202010,262,840Plasma processing apparatus201910,073,818Data processing method, data processing apparatus and processing apparatus201810,020,233Plasma processing apparatus and plasma processing method20189,934,946Plasma processing apparatus and operating method of plasma processing apparatus20189,865,439'Plasma processing apparatus'20189,805,940'Plasma processing apparatus and plasma processing method'20179,767,997'Plasma processing apparatus and operational method thereof'20179,741,629'Plasma processing apparatus and plasma processing method'20179,190,336'Plasma processing apparatus and plasma processing method'20158,992,721'Plasma processing apparatus'20158,784,677'Plasma processing apparatus and plasma processing method'20147,047,093'Semiconductor manufacturing apparatus and its diagnosis apparatus and operating system'20066,920,369'Methods of operating vacuum processing equipment and methods of processing wafers'20056,901,306'Semiconductor manufacturing apparatus and its diagnosis apparatus and operating system'20056,795,745'Methods of operating vacuum processing equipment and methods of processing wafers'20046,596,551'Etching end point judging method, etching end point judging device, and insulating film etching method using these methods'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2005Patents assigned to HITACHI LTD (3)· patent assignee history
2003–2019Based in Kudamatsu, JP· patent location history
2005–2020Patents assigned to HITACHI HIGH TECH CORP (16)· patent assignee history
2014–2015Patents assigned to INOUE SATOMI (2)· patent assignee history
2014–2015Patents assigned to KAGOSHIMA AKIRA (2)· patent assignee history
2014–2015Patents assigned to NAKAMOTO SHIGERU (2)· patent assignee history
2015–2020Based in Tokyo, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI HIGH TECH CORP162005–2020
HITACHI LTD32003–2005
INOUE SATOMI22014–2015
KAGOSHIMA AKIRA22014–2015
NAKAMOTO SHIGERUself22014–2015
Locations
LocationPatentsSpan
Tokyo, JP112015–2020
Kudamatsu, JP82003–2019