Inventor
MITSUAKI IWASHITA
Inventor
JP
Overview
Patents· 7 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1025%
H01LSemiconductor devices20%
C23CCoating metallic material15%
B05DProcesses for applying fluent materials to surfaces, in general5%
C09KMaterials for miscellaneous applications, not provided for elsewhere5%
C11DDetergent compositions5%
F25BRefrigeration machines, plants or systems5%
H01JElectric discharge tubes or discharge lamps5%
H10NElectric solid-state devices not otherwise provided for5%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h105%
PatentTitleYear
12,444,606Methods for forming vertically layered ionic liquid crystal (ILC) structures on a semiconductor substrate202512,435,426Substrate liquid processing apparatus and substrate liquid processing method202512,417,928Substrate processing method and substrate processing system202512,406,862Vacuum processing apparatus and oxidizing gas removal method202512,276,027Substrate processing apparatus and substrate processing method202512,247,768Electrocaloric effect element, heat transfer device, semiconductor manufacturing device, and electrocaloric effect element control method202512,011,738Substrate processing method and ionic liquid2024Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2024–2025Patents assigned to TOKYO ELECTRON LTD (7)· patent assignee history
2024–2025Based in JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 7 | 2024–2025 |
Locations
| Location | Patents | Span |
|---|---|---|
| JP | 7 | 2024–2025 |