Inventor

Tomonori Takahashi

Inventor

Chita, JP

Overview

1985–2021

Patent span

Chemistry

Primary field (CPC C)

Patents· 78 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

C04Bprimary

C04BLime, magnesia15%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%

B01DSeparation6%

C01BNon-metallic elements6%

H01LSemiconductor devices5%

C11DDetergent compositions5%

Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution5%

H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy5%

B01JChemical or physical processes, e.g. catalysis or colloid chemistry4%

Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests4%

PatentTitleYear

10,933,507Polishing apparatus2021 D0902661Bowl2020 10,696,933Cleaning formulation for removing residues on surfaces2020 10,689,553Moisture-curable hot melt adhesive for lighting appliances2020 10,533,146Cleaning formulations for removing residues on semiconductor substrates2020 10,490,417Etching composition2019 10,415,005Cleaning formulation for removing residues on surfaces2019 10,253,282Cleaning formulation for removing residues on surfaces2019 9,947,428Atomic beam source2018 9,834,746Cleaning formulations for removing residues on surfaces2017 9,726,978'Cleaning composition, cleaning process, and process for producing semiconductor device'2017 9,688,171'Vehicle seat'2017 9,562,211'Cleaning formulation for removing residues on surfaces'2017 9,396,926'Cleaning composition, cleaning process, and process for producing semiconductor device'2016 9,200,372'Passivation composition and process'2015 9,068,153'Cleaning composition, cleaning process, and process for producing semiconductor device'2015 8,889,025'Etching composition'2014 8,709,277'Etching composition'2014 8,669,217'Cleaning composition, cleaning process, and process for producing semiconductor device'2014 8,647,523'Etching composition'2014 8,617,417'Cleaning composition, method for producing semiconductor device, and cleaning method'2013 7,585,347'Ceramic filter'2009 7,288,199'Ceramic filter and method for purifying water'2007 7,053,016'Ceramic porous body and method of manufacturing glass usable as binder therefor'2006 6,646,177'Method for separation of p-xylene'2003 6,511,527'Method of treating exhaust gas'2003 6,479,099'Method for manufacturing filter having ceramic porous film as separating film'2002 6,461,406'Honeycomb type gas separating membrane structure'2002 6,403,041'Reaction vessel having an oxygen permeable membrane'2002 6,341,701'Ceramic porous membrane including ceramic of ceramic and ceramic sol particles, ceramic porous body including the membrane, and method of manufacturing the membrane'2002 6,279,491'Method of treating exhaust gas'2001 6,228,147'Method for operation of membrane reactor, and membrane reactor used therein'2001 6,179,902'Apparatus for recovering, refining, and storing hydrogen gas'2001 6,077,800'Ceramic porous membrane, ceramic filter using the same, and method of manufacturing the same'2000 6,062,064'Apparatus for sensing low concentration NOx'2000 6,044,689'Apparatus for sensing low concentration NOx, chamber used for apparatus for sensing low concentration NOx; gas sensor element and method of manufacturing the same; and ammonia removing apparatus and NOx sensor utilizing this apparatus'2000 6,006,586'Method of measuring gas concentration'1999 5,980,989'Gas separator and method for preparing it'1999 5,958,091'Hydrogen preparing apparatus'1999 5,948,966'Gas sensor, method of measuring gas component by utilizing gas sensor, and method of diagnosing malfunction of exhaust gas purifying apparatus'1999 5,897,970'System for production of high-purity hydrogen, process for production of high-purity hydrogen, and fuel cell system'1999 5,897,916'Process for production of coated ceramic member'1999 5,746,985'Reforming reactor'1998 5,741,474'Process for production of high-purity hydrogen'1998 5,705,129'NOx sensor'1998 5,683,824'Coated ceramic member and process for production thereof'1997 5,674,301'Hydrogen preparing apparatus'1997 5,614,001'Hydrogen separator, hydrogen separating apparatus and method for manufacturing hydrogen separator'1997 5,612,012'Method for removing carbon monoxide from reformed gas'1997 5,602,326'Apparatus and method for measuring concentrations of gas components'1997 5,518,530'Connected body comprising a gas separator and a metal, and apparatus for separating hydrogen gas from a mixed gas'1996 5,489,483'Porous sintered bodies and solid oxide fuel cells using such porous sintered bodies as air electrodes'1996 5,445,902'Method for operating a power generator'1995 5,432,024'Porous lanthanum manganite sintered bodies and solid oxide fuel cells'1995 5,380,596'Glass joint body and method of manufacturing the same'1995 5,366,941'Composite ceramics and their production process'1994 5,348,794'Monoaxially oriented multilayered packaging material'1994 5,256,491'Molded article of crystalline thermoplastic resin with high gas barrier property and production thereof'1993 5,238,882'Method of manufacturing silicon nitride sintered bodies'1993 5,229,340'Manufacture of MgO-based .beta.\"-alumina sintered bodies'1993 5,194,337'Glass joint body and method of manufacturing the same'1993 5,188,994'Beta alumina sintered body and method of manufacturing the same'1993 5,177,038'Silicon nitride sintered bodies'1993 5,137,853'Beta alumina sintered body and method of manufacturing the same'1992 4,940,680'Silicon nitride sintered members'1990 4,921,721'Silicon carbide sintered members'1990 4,882,109'Process of preparing zirconia-coated silicon nitride sintered member'1989 4,855,263'Silicon carbide sintered body and method of producing the same'1989 4,843,040'Silicon nitride sintered bodies'1989 4,818,733'Silicon nitride sintered bodies and a method of producing the same'1989 4,816,349'Zirconia-coated silicon nitride sintered member'1989 4,804,589'Silicon carbide sintered members'1989 4,801,414'Production of silicon nitride sintered body'1989 4,795,724'Silicon nitride sintered bodies and process for manufacturing the same'1989 4,747,984'Production of silicon nitride sintered body'1988 4,584,151'Method of producing a polycrystalline transparent spinel sintered body'1986 4,543,346'Polycrystalline transparent spinel sintered body and method of producing the same'1985 4,542,112'Method for producing spinel fine powders'1985

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1985–2018Patents assigned to NGK INSULATORS LTD (55)· patent assignee history

1985–2007Based in Nagoya, JP· patent location history

1988–2018Based in Chita, JP· patent location history

2013–2017Patents assigned to FUJIFILM CORP (8)· patent assignee history

2013–2020Patents assigned to TAKAHASHI TOMONORI (5)· patent assignee history

2013–2017Based in Haibara-gun, JP· patent location history

2014–2015Patents assigned to FUJIFILM ELECTRONIC MATERIALS (4)· patent assignee history

2014–2019Based in Mesa, AZ, US· patent location history

2015–2020Based in Shizuoka, JP· patent location history

2017–2020Patents assigned to FUJIFILM ELECTRONIC MAT USA INC (7)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
NGK INSULATORS LTD	55	1985–2018
FUJIFILM CORP	8	2013–2017
FUJIFILM ELECTRONIC MAT USA INC	7	2017–2020
TAKAHASHI TOMONORIself	5	2013–2020
FUJIFILM ELECTRONIC MATERIALS	4	2014–2015

Locations

Location	Patents	Span
Chita, JP	50	1988–2018
Shizuoka, JP	5	2015–2020
Mesa, AZ, US	5	2014–2019
Nagoya, JP	5	1985–2007
Haibara-gun, JP	4	2013–2017