Inventor
Chih-Hao Chang
Inventor
Jhubei City, TW
Overview
Patents· 121 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices21%
H01LSemiconductor devices19%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h108%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein4%
G06FElectric digital data processing4%
G09GArrangements or circuits for control of indicating devices using static means to present variable information3%
H02MApparatus for conversion between ac and ac, between ac and dc, or between dc and dc, and for use with mains or similar power supply systems2%
G06VImage or video recognition or understanding2%
H05KPrinted circuits2%
PatentTitleYear
10,868,004Semiconductor devices having Fin Field Effect Transistor (FinFET) structures and manufacturing and design methods thereof202010,818,661Fin-like field effect transistor (FinFET) device and method of manufacturing same202010,811,517Gate spacer structure of finFET device202010,789,444Display apparatus202010,761,359Touch display device202010,748,896Method for fabricating semiconductor device including contact bars having narrower portions202010,741,654Semiconductor device and forming method thereof202010,700,008Package structure having redistribution layer structures202010,692,983Semiconductor device and manufacturing method thereof202010,693,003Integrated circuit transistor structure with high germanium concentration SiGe stressor202010,684,634Method and system for compensating for temperature rise effects202010,573,751Structure and method for providing line end extensions for fin-type active regions202010,546,542Display brightness adjusting method, display brightness adjusting device, and display apparatus thereof202010,522,653Gate spacer structure of FinFET device201910,515,956Semiconductor devices having Fin Field Effect Transistor (FinFET) structures and manufacturing and design methods thereof201910,517,189Application and integration of a cableless server system201910,510,887Method for fabricating a strained structure and structure formed201910,503,953Display device having a light sensing unit201910,468,408Fin-like field effect transistor (FinFET) device and method of manufacturing same201910,395,598Pixel driving circuit and display apparatus thereof201910,366,989Semiconductor device having a contact bar over an S/D structure201910,340,435Thermoelectric conversion device201910,319,832FinFET device and method of forming same201910,276,509Integrated fan-out package201910,269,907Semiconductor device and manufacturing method thereof201910,203,795Touch display panel and driving method of touch mode201910,141,385Thin film transistor substrate and display panel using same201810,129,382Electronic device and method for controlling electronic device using headset201810,090,300Fin-like field effect transistor (FinFET) device and method of manufacturing same201810,037,994Semiconductor devices having Fin field effect transistor (FinFET) structures and manufacturing and design methods thereof201810,031,363Touch display device20189,978,630Curved wafer processing method and apparatus20189,947,756Semiconductor device and manufacturing method thereof20189,917,192'Structure and method for transistors with line end extension'20189,911,735'Fin-like field effect transistor (FinFET) device and method of manufacturing same'20189,899,288'Interconnect structures for wafer level package and methods of forming same'20189,870,997'Integrated fan-out package and method of fabricating the same'20189,818,745'Semiconductor devices having fin field effect transistor (FinFET) structures and manufacturing and design methods thereof'20179,771,324'Chemical film on substrate, method of forming the same, and method of forming N-hydroxysuccinimide ester-functionalized paracyclophane'20179,680,397'Three-phase inverting apparatus and control method and paralleled power conversion system thereof'20179,673,328'Structure and method for providing line end extensions for fin-type active regions'20179,660,082'Integrated circuit transistor structure with high germanium concentration SiGe stressor'20179,659,896'Interconnect structures for wafer level package and methods of forming same'20179,652,878'Electronic device and method for adjusting page'2017D0786380'Hurdle'20179,614,948'Telephone and audio controlling method thereof'20179,601,587'Semiconductor device having elevated structure'20179,586,224'Slit nozzle cleaning device'20179,564,529'Method for fabricating a strained structure and structure formed'20179,530,177'Layer access method, data access device and layer access arrangement method'20169,430,282'Scheduling multiple tasks in distributed computing system to avoid result writing conflicts'20169,413,270'Single-phase three-wire power control system and power control method therefor'20169,391,513'Method of current compensation based on division-sigma control for DC/DC converter'20169,375,743'Spray nozzle, spraying device having the spray nozzle and method for spraying'20169,373,549'Semiconductor device and method of forming the same'20169,362,123'Structure and method for integrated devices on different substartes with interfacial engineering'20169,363,503'Image access method and image access apparatus'20169,341,660'Load impedance estimation and repetitive control method capable of allowing inductance variation for inverter'20169,324,866'Structure and method for transistor with line end extension'20169,275,726'Static memory cell'20169,276,311'Panel antenna'20169,236,253'Strained structure of a semiconductor device'20169,219,152'Semiconductor device with a buried stressor'20159,214,558'Method of forming semiconductor device including silicide layers'20159,188,628'Load apparatus for testing'20159,190,417'Fin-like field effect transistor (FinFET) device and method of manufacturing same'20159,166,022'Fin-like field effect transistor (FinFET) device and method of manufacturing same'20159,147,594'Method for fabricating a strained structure'20159,135,894'Data access method and electronic apparatus for accessing data'20159,120,669'Process for making nanocone structures and using the structures to manufacture nanostructured glass'20159,105,744'Semiconductor devices having inactive fin field effect transistor (FinFET) structures and manufacturing and design methods thereof'20159,105,130'View synthesis method capable of depth mismatching checking and depth error compensation'20159,075,311'Manufacturing method of microstructure'20159,054,188'Curved wafer processing on method and apparatus'20159,042,000'Flexible liquid crystal display and flexible fluid display'20158,982,139'Image refreshing method and associated image processing apparatus'20158,946,828'Semiconductor device having elevated structure and method of manufacturing the same'20158,935,452'Connector assembly'20158,921,679'Thermoelectric module and method of fabricating the same'20148,854,235'Decompression circuit and associated compression method and decompression method'20148,854,234'Decompression circuit and associated decompression method'20148,836,872'Switchable three-dimensional display'20148,833,999'Electronic device having a flexible screen, a backlight module and a light guide plate'20148,804,065'Flexible liquid crystal display and flexible fluid display'20148,759,920'Semiconductor device and method of forming the same'20148,754,486'IO ESD device and methods for forming the same'20148,727,601'Display for electronic device'20148,703,565'Bottom-notched SiGe FinFET formation using condensation'20148,686,516'Silicide formation and associated devices'20148,662,731'Foldable backlit display and device having the same'20148,623,728'Method for forming high germanium concentration SiGe stressor'20148,623,721'Silicide formation and associated devices'20148,564,995'Method for controlling three-phase current converter'20138,553,156'HDMI and VGA compatible interface circuit'20138,551,841'IO ESD device and methods for forming the same'20138,513,912'Power supply circuit'20138,507,996'Block contact plugs for MOS devices'20138,497,528'Method for fabricating a strained structure'20138,466,027'Silicide formation and associated devices'20138,414,302'Modular educational device'20138,397,008'Docking station'20138,395,195'Bottom-notched SiGe FinFET formation using condensation'20138,367,498'Fin-like field effect transistor (FinFET) device and method of manufacturing same'20138,338,259'Semiconductor device with a buried stressor'20128,306,111'Image analysis using a hybrid connected component labeling process'20128,287,941'Method of increasing beta-phase content in a conjugated polymer useful as a light emitting layer in a polymer light emitting diode'20128,206,275'Balance training device'2012D0650339'Illumination device'20117,915,414'Blue-emitting organometallic complexes and their application'20117,893,359'Embedded capacitor core having a multiple-layer structure'20117,724,615'Apparatus and method for determining type of an optical disk'20107,525,628'Planar display module'20097,402,755'Circuit board with quality-indicator mark and method for indicating quality of the circuit board'20087,375,017'Method for fabricating semiconductor device having stacked-gate structure'20087,349,196'Composite distributed dielectric structure'20087,344,995'Method for preparing a structure with high aspect ratio'20087,164,643'Data extraction for an optical disc drive'20077,084,345'Slide cover unit'20067,022,603'Method for fabricating semiconductor device having stacked-gate structure'20066,741,626'Common assembly structure of laser diode and monitoring PIN detector'20045,563,098'Buried contact oxide etch with poly mask procedure'1996Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1996–2016Patents assigned to TAIWAN SEMICONDUCTOR MFG (26)· patent assignee history
1996–2020Based in Hsinchu, TW· patent location history
2006–2017Based in Taipei, TW· patent location history
2011–2017Patents assigned to CHANG CHIH-HAO (34)· patent assignee history
2012–2020Based in Jhubei City, TW· patent location history
2013–2020Patents assigned to HON HAI PREC IND CO LTD (7)· patent assignee history
2013–2020Based in New Taipei, TW· patent location history
2014–2017Patents assigned to WISTRON CORP (7)· patent assignee history
2014–2020Based in Hsinchu County, TW· patent location history
2017–2020Patents assigned to TAIWAN SEMICONDUCTOR MFG CO LTD (31)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| CHANG CHIH-HAOself | 34 | 2011–2017 |
| TAIWAN SEMICONDUCTOR MFG CO LTD | 31 | 2017–2020 |
| TAIWAN SEMICONDUCTOR MFG | 26 | 1996–2016 |
| HON HAI PREC IND CO LTD | 7 | 2013–2020 |
| WISTRON CORP | 7 | 2014–2017 |
Locations
| Location | Patents | Span |
|---|---|---|
| Jhubei City, TW | 44 | 2012–2020 |
| New Taipei, TW | 17 | 2013–2020 |
| Hsinchu, TW | 14 | 1996–2020 |
| Hsinchu County, TW | 8 | 2014–2020 |
| Taipei, TW | 7 | 2006–2017 |