Inventor
Yutaka Usubuchi
Inventor
Fuji, JP
Overview
Patents· 6 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
C07Dprimary
C07DHeterocyclic compounds20%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests20%
B01JChemical or physical processes, e.g. catalysis or colloid chemistry10%
C08FMacromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds10%
C08GMacromolecular compounds obtained otherwise than by reactions only involving unsaturated carbon-to-carbon bonds10%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices10%
G09FDisplaying10%
H01JElectric discharge tubes or discharge lamps10%
PatentTitleYear
5,177,171'Sulfonic acid group-containing polyurethane and a photosensitive resin composition containing the same'19935,053,316'Thermoplastic elastomer and photosensitive resin composition based thereon, and printing plate precursor comprising the composition'19914,820,021'Light-shielding screen and a process for producing the same'19894,245,107'Cephalosporin derivatives and process for preparing the same'19814,172,197'Cephalosporin derivatives and process for preparing the same'19793,932,497'Process for preparing 4-aminomethyl cyclohexane carboxylic acid-1'1976Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1976–1993Patents assigned to ASAHI CHEMICAL IND (6)· patent assignee history
1976Based in Tokyo, JP· patent location history
1979–1981Based in Yokohama, JP· patent location history
1989–1993Based in Fuji, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASAHI CHEMICAL IND | 6 | 1976–1993 |
Locations
| Location | Patents | Span |
|---|---|---|
| Fuji, JP | 3 | 1989–1993 |
| Yokohama, JP | 2 | 1979–1981 |
| Tokyo, JP | 1 | 1976 |