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Inventor

Yoshitaka Nishijima

Inventor
Tatsuno-machi, JP

Overview

2→
Patents
1999–2006
Patent span
Chemistry
Primary field (CPC C)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1029%
C09GPolishing compositions14%
C23FNon-mechanical removal of metallic material from surface14%
C25DProcesses for the electrolytic or electrophoretic production of coatings14%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices14%
G05DSystems for controlling or regulating non-electric variables14%
PatentTitleYear
7,101,517'Processing solution preparation and supply method and apparatus'20065,896,874'Apparatus for controlling resist stripping solution'1999

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1999Patents assigned to HIRAMA RIKA KENKYUJO LTD (1)· patent assignee history
1999Patents assigned to NAGASE & CO LTD (1)· patent assignee history
1999Based in Hyogo, JP· patent location history
2006Patents assigned to NAGASE CMS TECHNOLOGY CO LTD (1)· patent assignee history
2006Based in Tatsuno-machi, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HIRAMA RIKA KENKYUJO LTD11999
NAGASE & CO LTD11999
NAGASE CMS TECHNOLOGY CO LTD12006
Locations
LocationPatentsSpan
Tatsuno-machi, JP12006
Hyogo, JP11999