Inventor

Kazushige Takechi

Inventor
Tokyo, JP

Overview

39→
Patents
1997–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 39 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Dprimary
H10DInorganic electric semiconductor devices30%
H01LSemiconductor devices13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G02FOptical devices or arrangements for the control of light by modification of the optical properties of the media of the elements involved therein7%
H10KOrganic electric solid-state devices6%
C09KMaterials for miscellaneous applications, not provided for elsewhere3%
G01NInvestigating or analysing materials by determining their chemical or physical properties3%
G09GArrangements or circuits for control of indicating devices using static means to present variable information3%
H05KPrinted circuits3%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation3%
PatentTitleYear
10,797,088Semiconductor device, display apparatus, method of manufacturing semiconductor device and method of manufacturing display apparatus202010,714,632Electrostatic sensing device202010,707,293Display device202010,538,800Biosensor and detection device202010,439,069Optical sensor element and photoelectric conversion device201910,388,798Thin film transistor, display device, transistor circuit, and driving method of thin film transistor201910,385,377Biosensor and detection device201910,355,028Semiconductor device, display apparatus, method of manufacturing semiconductor device and method of manufacturing display apparatus201910,186,674Thin-film device having barrier film and manufacturing method thereof20199,806,123'Image sensor and manufacturing method thereof'20179,664,642'TFT ion sensor and TFT ion sensor apparatus using the same'20179,401,382'Image sensor and manufacturing method thereof'20169,378,981'Thin film device and manufacturing method thereof'20169,209,026'Method of fabricating a thin-film device'20159,048,319'Thin film device and manufacturing method thereof'20158,889,480'Method of fabricating a thin-film device'20148,785,925'Thin film device'20148,477,267'Light-condensing film, liquid-crystal panel and backlight as well as manufacturing process for light-condensing film'20138,420,442'Method of fabricating a thin-film device'20138,232,124'Thin-film transistor array, method of fabricating the same, and liquid crystal display device including the same'20127,989,805'Electronic device improved in heat radiation performance for heat generated from active element'20117,884,360'Thin-film device and method of fabricating the same'20117,852,435'Light-condensing film, liquid-crystal panel and backlight as well as manufacturing process for light-condensing film'20107,823,595'Apparatus for etching substrate and method of fabricating thin-glass substrate'20107,804,091'Thin-film transistor array, method of fabricating the same, and liquid crystal display device including the same'20107,736,997'Production method of flexible electronic device'20107,714,327'Electronic device improved in heat radiation performance for heat generated from active element'20107,652,292'Flexible electronic device and production method of the same'20107,579,222'Manufacturing method of thin film device substrate'20097,381,285'Manufacturing method of a device'20087,271,415'Flexible electronic device and production method of the same'20077,256,102'Manufacturing method of thin film device substrate'20077,122,444'Manufacturing method of thin film device substrate'20066,890,783'Active matrix substrate plate and manufacturing method therefor'20056,632,696'Manufacturing method of active matrix substrate plate and manufacturing method therefor'20036,579,749'Fabrication method and fabrication apparatus for thin film transistor'20036,566,174'Thin-film transistor elements and methods of making same'20036,429,456'Thin-film transistor elements and methods of making same'20025,648,293'Method of growing an amorphous silicon film'1997

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1997–2012Patents assigned to NEC CORP (18)· patent assignee history
1997–2015Based in Tokyo, JP· patent location history
2012–2019Patents assigned to NLT TECHNOLOGIES LTD (13)· patent assignee history
2012–2016Patents assigned to TAKECHI KAZUSHIGE (8)· patent assignee history
2012–2015Patents assigned to NAKATA MITSURU (4)· patent assignee history
2014–2020Based in Kanagawa, JP· patent location history
2016–2020Based in Kawasaki, JP· patent location history
2019–2020Patents assigned to TIANMA JAPAN LTD (6)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NEC CORP181997–2012
NLT TECHNOLOGIES LTD132012–2019
TAKECHI KAZUSHIGEself82012–2016
TIANMA JAPAN LTD62019–2020
NAKATA MITSURU42012–2015
Locations
LocationPatentsSpan
Tokyo, JP241997–2015
Kanagawa, JP92014–2020
Kawasaki, JP62016–2020