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Inventor

Chih-Yun Lin

Inventor
Hsinchu, TW

Overview

2→
Patents
2012–2018
Patent span
Electricity
Primary field (CPC H)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G01Jprimary
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light14%
G02BOptical elements, systems or apparatus14%
H01LSemiconductor devices14%
H10BElectronic memory devices14%
H10DInorganic electric semiconductor devices14%
H10FInorganic semiconductor devices sensitive to infrared radiation, light, electromagnetic radiation of shorter wavelength or corpuscular radiation14%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1014%
PatentTitleYear
10,132,970Color filter device and forming method thereof20188,114,756'Method and manufacture for high voltage gate oxide formation after shallow trench isolation formation'2012

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2012Patents assigned to LIN CHIH-YUN (1)· patent assignee history
2012Patents assigned to SPANSION LLC (1)· patent assignee history
2012Patents assigned to WANG FEI (1)· patent assignee history
2012Based in Kaohsiung, TW· patent location history
2018Patents assigned to UNITED MICROELECTRONICS CORP (1)· patent assignee history
2018Based in Hsinchu, TW· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LIN CHIH-YUNself12012
SPANSION LLC12012
UNITED MICROELECTRONICS CORP12018
WANG FEI12012
Locations
LocationPatentsSpan
Hsinchu, TW12018
Kaohsiung, TW12012