Inventor
Warren K. Waskiewicz
Inventor
Clinton, NJ, US
Overview
Patents· 18 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H01Jprimary
H01JElectric discharge tubes or discharge lamps30%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
B82YSpecific uses or applications of nanostructures16%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices7%
G21KHandling of particles or ionising radiation not otherwise provided for5%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling2%
G01BMeasuring length, thickness or similar linear dimensions2%
H01LSemiconductor devices2%
H10DInorganic electric semiconductor devices2%
PatentTitleYear
8,859,395'Techniques for curvature control in power transistor devices'20147,581,203'Method and apparatus for manufacturing multiple circuit patterns using a multiple project mask'20097,345,290'Lens array for electron beam lithography tool'20087,179,148'Cathode with improved work function and method for making the same'20076,815,876'Cathode with improved work function and method for making the same'20046,620,565'Electron beam lithography apparatus focused through spherical aberration introduction'20036,492,647'Electron guns for lithography tools'20026,448,569'Bonded article having improved crystalline structure and work function uniformity and method for making the same'20026,440,620'Electron beam lithography focusing through spherical aberration introduction'20026,420,714'Electron beam imaging apparatus'20026,400,090'Electron emitters for lithography tools'20026,333,508'Illumination system for electron beam lithography tool'20016,324,933'Planar movable stage mechanism'20016,232,040'Method of electron beam exposure utilizing emitter with conductive mesh grid'20015,663,568'Apparatus for controlling a charged particle beam and a lithographic process in which the apparatus is used'19975,500,312'Masks with low stress multilayer films and a process for controlling the stress of multilayer films'19965,356,662'Method for repairing an optical element which includes a multilayer coating'19945,265,143'X-ray optical element including a multilayer coating'1993Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1993–1994Patents assigned to AT & T BELL LAB (2)· patent assignee history
1993–2014Based in Clinton, NJ, US· patent location history
1997–2001Patents assigned to LUCENT TECHNOLOGIES INC (2)· patent assignee history
2001–2009Patents assigned to AGERE SYSTEMS INC (8)· patent assignee history
2001–2002Patents assigned to AGERE SYST GUARDIAN CORP (4)· patent assignee history
2014Patents assigned to AGERE SYSTEMS LLC (1)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| AGERE SYSTEMS INC | 8 | 2001–2009 |
| AGERE SYST GUARDIAN CORP | 4 | 2001–2002 |
| AT & T BELL LAB | 2 | 1993–1994 |
| LUCENT TECHNOLOGIES INC | 2 | 1997–2001 |
| AGERE SYSTEMS LLC | 1 | 2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Clinton, New Jersey, US | 18 | 1993–2014 |