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Inventor

Eric Calvin HANSEN

Inventor
US

Overview

2→
Patents
2026
Patent span
Physics
Primary field (CPC G)

Patents· 2 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices40%
C09KMaterials for miscellaneous applications, not provided for elsewhere20%
H01LSemiconductor devices20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1020%
PatentTitleYear
12,585,184Photoresist with multiple patterning radiation-absorbing elements and/or vertical composition gradient202612,577,466Photoresist development with organic vapor2026

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2026Patents assigned to LAM RES CORP (2)· patent assignee history
2026Based in US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
LAM RES CORP22026
Locations
LocationPatentsSpan
US22026