Inventor
Takenori Hirose
Inventor
Yokohama, JP
Overview
Patents· 23 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G11Bprimary
G11BInformation storage based on relative movement between record carrier and transducer20%
G01BMeasuring length, thickness or similar linear dimensions17%
G01NInvestigating or analysing materials by determining their chemical or physical properties17%
B24BMachines, devices, or processes for grinding or polishing11%
B82YSpecific uses or applications of nanostructures9%
G01QScanning-probe techniques or apparatus9%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h107%
G06TImage data processing or generation, in general4%
G01JMeasurement of intensity, velocity, spectral content, polarisation, phase or pulse characteristics of infrared, visible or ultraviolet light2%
G06VImage or video recognition or understanding2%
PatentTitleYear
10,393,509Pattern height measurement device and charged particle beam device20199,304,145'Inspection method and its apparatus for thermal assist type magnetic head element'20168,787,134'Thermally assisted magnetic recording head inspection method and apparatus'20148,713,710'Cantilever of scanning probe microscope and method for manufacturing the same, method for inspecting thermal assist type magnetic head device and its apparatus'20148,638,430'Method for defect determination in fine concave-convex pattern and method for defect determination on patterned medium'20148,621,659'Cantilever for magnetic force microscope and method of manufacturing the same'20138,483,035'Thermally assisted magnetic recording head inspection method and apparatus'20138,411,928'Scatterometry method and device for inspecting patterned medium'20138,279,431'Spectral detection method and device, and defect inspection method and apparatus using the same'20128,259,414'Magnetic recording disk having aligning pattern and method for aligning thereof'20128,260,029'Pattern shape inspection method and apparatus thereof'20128,148,705'Method and apparatus for inspecting defects of patterns formed on a hard disk medium'20128,040,772'Method and apparatus for inspecting a pattern shape'20117,969,567'Method and device for detecting shape of surface of medium'20117,243,441'Method and apparatus for measuring depth of holes formed on a specimen'20077,119,908'Method and apparatus for measuring thickness of thin film and device manufacturing method using same'20067,057,744'Method and apparatus for measuring thickness of thin film and device manufacturing method using same'20067,020,306'Polishing pad surface condition evaluation method and an apparatus thereof and a method of producing a semiconductor device'20066,987,874'Method and apparatus for managing surface image of thin film device, and method and apparatus for manufacturing thin film device using the same'20066,897,079'Method of detecting and measuring endpoint of polishing processing and its apparatus and method of manufacturing semiconductor device using the same'20056,806,970'Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same'20046,794,206'Method of polishing a film'20046,753,972'Thin film thickness measuring method and apparatus, and method and apparatus for manufacturing a thin film device using the same'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2012Patents assigned to HITACHI LTD (10)· patent assignee history
2004–2013Based in Yokohama, JP· patent location history
2004–2007Based in Machida, JP· patent location history
2011–2019Patents assigned to HITACHI HIGH TECH CORP (10)· patent assignee history
2012–2014Patents assigned to HIROSE TAKENORI (8)· patent assignee history
2012–2014Patents assigned to SASAZAWA HIDEAKI (4)· patent assignee history
2012–2013Patents assigned to WATANABE MASAHIRO (3)· patent assignee history
2012Based in Kanagawa, JP· patent location history
2013–2019Based in Tokyo, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| HITACHI HIGH TECH CORP | 10 | 2011–2019 |
| HITACHI LTD | 10 | 2004–2012 |
| HIROSE TAKENORIself | 8 | 2012–2014 |
| SASAZAWA HIDEAKI | 4 | 2012–2014 |
| WATANABE MASAHIRO | 3 | 2012–2013 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yokohama, JP | 8 | 2004–2013 |
| Tokyo, JP | 7 | 2013–2019 |
| Machida, JP | 7 | 2004–2007 |
| Kanagawa, JP | 1 | 2012 |