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Inventor

Tomomi Nakamura

Inventor
Tokyo, JP

Overview

13→
Patents
2000–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 13 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

Y02Eprimary
Y02EReduction of greenhouse gas [ghg] emissions, related to energy generation, transmission or distribution17%
H01MProcesses or means, e.g. batteries, for the direct conversion of chemical energy into electrical energy13%
Y02PClimate change mitigation technologies in the production or processing of goods13%
G03GElectrography10%
H02KDynamo-electric machines7%
H04NPictorial communication, e.g. television7%
B23QDetails, components, or accessories for machine tools, e.g. arrangements for copying or controlling3%
C09BOrganic dyes or closely-related compounds for producing dyes, e.g. pigments3%
C21DModifying the physical structure of ferrous metals3%
C22CAlloys3%
PatentTitleYear
10,928,428Measuring apparatus202110,714,732Current collecting lead and production method for secondary battery including current collecting lead202010,374,260Cylindrical alkaline secondary battery20198,989,339'Zirconium alloy material'20158,815,451'Negative-electrode plate and cylindrical cell including same'20148,785,019'Negative electrode for a nickel-hydrogen rechargeable battery and a nickel-hydrogen rechargeable battery using the same'20148,709,690'Electrophotographic photoreceptor and image forming apparatus including the same'20147,657,991'Magnetization apparatus and magnetization method'20107,489,413'Apparatus having means for printing video signals of video camera attached thereto'20097,456,979'Apparatus having means for printing video signals of video camera attached thereto'20086,472,114'Coating fluid for electric charge generating layer, organic electrophotographic receptor, and method to manufacturing the same'20026,447,965'Electrophotographic photoreceptor containing TiOPc, method for manufacturing the same, and coating liquid for charge generating layer'20026,073,746'Assembled part in assembly line'2000

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2000–2010Patents assigned to ASMO CO LTD (2)· patent assignee history
2000–2010Based in Hamamatsu, JP· patent location history
2002–2014Patents assigned to SHARP KK (3)· patent assignee history
2002–2014Based in Osaka, JP· patent location history
2008–2020Based in Tokyo, JP· patent location history
2014–2015Patents assigned to NAKAMURA TOMOMI (4)· patent assignee history
2014Patents assigned to FDK TWICELL CO LTD (2)· patent assignee history
2014Based in Takasaki, JP· patent location history
2019–2020Patents assigned to FDK CORP (2)· patent assignee history
2021Based in Nagano, JP· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
NAKAMURA TOMOMIself42014–2015
SHARP KK32002–2014
ASMO CO LTD22000–2010
FDK CORP22019–2020
FDK TWICELL CO LTD22014
Locations
LocationPatentsSpan
Tokyo, JP42008–2020
Takasaki, JP22014
Osaka, JP22002–2014
Hamamatsu, JP22000–2010
Nagano, JP12021