Inventor
Shuji Moriya
Inventor
Yamanashi, JP
Overview
Patents· 38 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Pprimary
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1017%
G03GElectrography16%
C23CCoating metallic material10%
G05DSystems for controlling or regulating non-electric variables10%
Y10TTechnical subjects covered by former us classification10%
H01LSemiconductor devices6%
H01JElectric discharge tubes or discharge lamps5%
F16LPipes4%
G01FMeasuring volume, volume flow, mass flow or liquid level4%
G01NInvestigating or analysing materials by determining their chemical or physical properties4%
PatentTitleYear
10,786,837Method for cleaning chamber of substrate processing apparatus202010,312,101Substrate processing method and substrate processing apparatus20199,691,630'Etching method'20179,435,470'Pipe joint'20169,371,946'Pipe joint'20169,236,272'Etching apparatus and etching method'20169,150,965'Processing apparatus'20159,026,011'Image forming apparatus'20159,012,331'Etching method and non-transitory storage medium'20158,893,743'Flow rate controller and processing apparatus'20148,434,522'Fluid control apparatus'20138,381,755'Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same'20138,219,329'Thermal type mass flow meter, and thermal type mass flow control device'20128,210,022'Pressure type flow rate control reference and corrosion resistant pressure type flow rate controller used for the same'20128,104,516'Gas supply unit and gas supply system'20128,019,260'Image forming apparatus'20117,962,076'Image forming apparatus'20117,862,638'Gas supply system for semiconductor manufacturing apparatus'20117,734,205'Image forming apparatus'20107,682,843'Semiconductor fabrication system, and flow rate correction method and program for semiconductor fabrication system'20107,440,718'Developing apparatus featuring image defect supression'20087,383,003'Developing apparatus for preventing ghost images and uneven image density'20087,379,693'Developing apparatus'20087,251,441'Developing apparatus including magnetic field generating means, for use with a developer which includes a magnetic toner component'20077,239,831'Image forming apparatus when a maximum developing bias voltage |V| max and surface potential Vd of a charged image bearing member satisfy: |V| max≦|Vd|'20077,233,758'Developing apparatus featuring a developer carrying member with an elastic surface layer'20076,834,613'Plasma-resistant member and plasma treatment apparatus using the same'20046,737,666'Apparatus and method for detecting an end point of a cleaning process'20046,738,593'Developing device with developer bearing member overlying developer containing chamber'20046,614,004'Heater including heat dissipation resistor on substrate and image heating apparatus equipped with the heater'20036,516,166'Image fixing apparatus'20036,346,425'Vapor-phase processing method capable of eliminating particle formation'20025,578,129'Gas supplying head and load lock chamber of semiconductor processing system'19965,494,522'Plasma process system and method'19965,441,076'Processing apparatus using gas'19955,439,026'Processing apparatus and flow control arrangement therefor'19955,421,365'Flow control apparatus'19955,294,280'Gas measuring device and processing apparatus provided with the gas measuring device'1994Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1994–2020Patents assigned to TOKYO ELECTRON LTD (22)· patent assignee history
1994–2013Based in Tokyo, JP· patent location history
1995–2020Based in Yamanashi, JP· patent location history
2002–2017Based in Nirasaki, JP· patent location history
2003–2015Patents assigned to CANON KK (13)· patent assignee history
2003–2011Based in Shizuoka, JP· patent location history
2012–2016Patents assigned to MORIYA SHUJI (7)· patent assignee history
2012–2016Patents assigned to FUJIKIN KK (5)· patent assignee history
2012–2016Patents assigned to SHINOHARA TSUTOMU (4)· patent assignee history
2016Based in Minato-ku, JP· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| TOKYO ELECTRON LTD | 22 | 1994–2020 |
| CANON KK | 13 | 2003–2015 |
| MORIYA SHUJIself | 7 | 2012–2016 |
| FUJIKIN KK | 5 | 2012–2016 |
| SHINOHARA TSUTOMU | 4 | 2012–2016 |
Locations
| Location | Patents | Span |
|---|---|---|
| Yamanashi, JP | 13 | 1995–2020 |
| Nirasaki, JP | 8 | 2002–2017 |
| Shizuoka, JP | 8 | 2003–2011 |
| Tokyo, JP | 3 | 1994–2013 |
| Minato-ku, JP | 1 | 2016 |