LexDanaLexDanabeta
Inventor

Steven Lane

Inventor
Porterville, CA, US

Overview

39→
Patents
1996–2020
Patent span
Electricity
Primary field (CPC H)

Patents· 39 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps32%
H01QAntennas, i.e. radio aerials13%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
H01LSemiconductor devices10%
H04BTransmission8%
C23CCoating metallic material6%
H05HPlasma technique4%
C23FNon-mechanical removal of metallic material from surface3%
Y02DClimate change mitigation technologies in information and communication technologies [ict], i.e. information and communication technologies aiming at the reduction of their own energy use3%
C01BNon-metallic elements1%
PatentTitleYear
10,790,153Methods and apparatus for electron beam etching process202010,784,085Plasma processing reactor with a magnetic electron-blocking filter external of the chamber and uniform field within the chamber202010,707,086Etching methods202010,544,505Deposition or treatment of diamond-like carbon in a plasma reactor202010,395,904Method of real time in-situ chamber condition monitoring using sensors and RF communication201910,249,479Magnet configurations for radial uniformity tuning of ICP plasmas201910,249,495Diamond like carbon layer formed by an electron beam plasma process201910,170,278Inductively coupled plasma source201910,153,139Multiple electrode substrate support assembly and phase control system201810,141,166Method of real time in-situ chamber condition monitoring using sensors and RF communication201810,115,566Method and apparatus for controlling a magnetic field in a plasma chamber201810,017,857Method and apparatus for controlling plasma near the edge of a substrate20189,721,760'Electron beam plasma source with reduced metal contamination'20179,659,751'System and method for selective coil excitation in inductively coupled plasma processing reactors'20179,613,783'Method and apparatus for controlling a magnetic field in a plasma chamber'20179,564,297'Electron beam plasma source with remote radical source'20179,472,379'Method of multiple zone symmetric gas injection for inductively coupled plasma'20169,449,794'Symmetrical inductively coupled plasma source with side RF feeds and spiral coil antenna'20169,443,700'Electron beam plasma source with segmented suppression electrode for uniform plasma generation'20169,412,563'Spatially discrete multi-loop RF-driven plasma source having plural independent zones'20169,111,722'Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator'20159,082,591'Three-coil inductively coupled plasma source with individually controlled coil currents from a single RF power generator'20158,734,664'Method of differential counter electrode tuning in an RF plasma reactor'20147,554,334'Matching network characterization using variable impedance analysis'20097,171,158'Satellite communication system using linear cell tracking'20076,943,625'Gain and phase balanced amplifier redundancy system'20056,799,014'Satellite transmission system with adaptive transmission loss compensation'20046,441,785'Low sidelobe antenna with beams steerable in one direction'20026,430,393'Satellite communication system using linear cell tracking'20026,421,528'Satellite transmission system with adaptive transmission loss compensation'20026,393,255'Satellite antenna pointing system'20026,366,256'Multi-beam reflector antenna system with a simple beamforming network'20026,340,949'Multiple beam phased array with aperture partitioning'20026,078,287'Beam forming network incorporating phase compensation'20006,025,809'Antenna radiating element'20005,847,681'Communication and tracking antenna systems for satellites'19985,818,388'Satellite communications apparatus using active redundancy'19985,784,030'Calibration method for satellite communications payloads using hybrid matrices'19985,532,706'Antenna array of radiators with plural orthogonal ports'1996

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1996–1998Based in Torrance, CA, US· patent location history
1998–2002Patents assigned to HUGHES ELECTRONICS CORP (11)· patent assignee history
2000–2005Based in Rolling Hills Estates, CA, US· patent location history
2002–2007Based in Rolling Hills, CA, US· patent location history
2004–2005Patents assigned to BOEING CO (2)· patent assignee history
2007Patents assigned to DIRECTV GROUP INC (1)· patent assignee history
2009Patents assigned to APPLIED MARTERIALS INC (1)· patent assignee history
2009–2016Based in San Jose, CA, US· patent location history
2014–2020Patents assigned to APPLIED MATERIALS INC (23)· patent assignee history
2014–2020Based in Porterville, CA, US· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
APPLIED MATERIALS INC232014–2020
HUGHES ELECTRONICS CORP111998–2002
BOEING CO22004–2005
APPLIED MARTERIALS INC12009
DIRECTV GROUP INC12007
Locations
LocationPatentsSpan
Porterville, California, US212014–2020
Rolling Hills Estates, California, US92000–2005
Torrance, California, US41996–1998
San Jose, California, US22009–2016
Rolling Hills, California, US22002–2007