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Inventor

Sangki Hong

Inventor
Singapore, SG

Overview

15→
Patents
2001–2021
Patent span
Electricity
Primary field (CPC H)

Patents· 15 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H10Wprimary
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1057%
H04BTransmission10%
H04LTransmission of digital information, e.g. telegraphic communication10%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1010%
C23FNon-mechanical removal of metallic material from surface5%
H04WWireless communication networks5%
H10DInorganic electric semiconductor devices5%
PatentTitleYear
10,958,318Apparatus and method for uplink transmission in wireless communication system202110,887,889Method and device for providing different services in mobile communication system20218,222,121'Fiducial scheme adapted for stacked integrated circuits'20128,183,127'Method for bonding wafers to produce stacked integrated circuits'20127,898,095'Fiducial scheme adapted for stacked integrated circuits'20117,750,488'Method for bonding wafers to produce stacked integrated circuits'20106,566,260'Non-metallic barrier formations for copper damascene type interconnects'20036,531,390'Non-metallic barrier formations for copper damascene type interconnects'20036,489,233'Non-metallic barrier formations for copper damascene type interconnects'20026,429,122'Non metallic barrier formations for copper damascene type interconnects'20026,376,353'Aluminum and copper bimetallic bond pad scheme for copper damascene interconnects'20026,372,636'Composite silicon-metal nitride barrier to prevent formation of metal fluorides in copper damascene'20026,352,917'Reversed damascene process for multiple level metal interconnects'20026,284,657'Non-metallic barrier formation for copper damascene type interconnects'20016,225,202'Selective etching of unreacted nickel after salicidation'2001

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2001–2003Patents assigned to CHARTERED SEMICONDUCTOR MFG (9)· patent assignee history
2001–2012Based in Singapore, SG· patent location history
2003Based in Bakie Regency, SG· patent location history
2010–2012Patents assigned to TEZZARON SEMICONDUCTOR INC (4)· patent assignee history
2012Patents assigned to HONG SANGKI (2)· patent assignee history
2012Patents assigned to PATTI ROBERT (2)· patent assignee history
2021Patents assigned to SAMSUNG ELECTRONICS CO LTD (2)· patent assignee history
2021Based in Suwon-si, KR· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
CHARTERED SEMICONDUCTOR MFG92001–2003
TEZZARON SEMICONDUCTOR INC42010–2012
HONG SANGKIself22012
PATTI ROBERT22012
SAMSUNG ELECTRONICS CO LTD22021
Locations
LocationPatentsSpan
Singapore, SG122001–2012
Suwon-si, KR22021
Bakie Regency, SG12003