Inventor
Hannes Loferer
Inventor
Ortenburg, DE
Overview
Patents· 4 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G01Bprimary
G01BMeasuring length, thickness or similar linear dimensions33%
G06TImage data processing or generation, in general22%
G01MTesting static or dynamic balance of machines or structures11%
G01NInvestigating or analysing materials by determining their chemical or physical properties11%
G06FElectric digital data processing11%
H04NPictorial communication, e.g. television11%
PatentTitleYear
11,125,550Method and device for optically measuring the surface of a measurement object202111,092,432Reference plate and method for calibrating and/or checking a deflectometry sensor system20217,266,468'Structural data analysis system'20077,113,878'Target for calibrating a non-contact sensor'2006Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2006–2007Patents assigned to PERCEPTRON INC (2)· patent assignee history
2006–2007Based in Ann Arbor, MI, US· patent location history
2021Patents assigned to MICRO EPSILON MESSTECHNIK GMBH & CO KG (2)· patent assignee history
2021Based in Ortenburg, DE· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| MICRO EPSILON MESSTECHNIK GMBH & CO KG | 2 | 2021 |
| PERCEPTRON INC | 2 | 2006–2007 |
Locations
| Location | Patents | Span |
|---|---|---|
| Ortenburg, DE | 2 | 2021 |
| Ann Arbor, MI, US | 2 | 2006–2007 |