Inventor
Bijan Davari
Inventor
Mahopac, NY, US
Overview
Patents· 19 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
H10Dprimary
H10DInorganic electric semiconductor devices21%
H10BElectronic memory devices14%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1014%
H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h1012%
Y10STechnical subjects covered by former uspc cross-reference art collections [xracs] and digests9%
G11CStatic stores5%
H04LTransmission of digital information, e.g. telegraphic communication5%
H04WWireless communication networks5%
C25DProcesses for the electrolytic or electrophoretic production of coatings2%
G01RMeasuring electric variables2%
PatentTitleYear
10,085,157Reconfiguring a mobile network based on cellular network state information20189,838,108IP based real-time communications over a mobile network20177,974,826'Energy system modeling apparatus and methods'20117,356,383'Methods and apparatus for optimizing combined cycle/combined process facilities'20086,800,518'Formation of patterned silicon-on-insulator (SOI)/silicon-on-nothing (SON) composite structure by porous Si engineering'20046,756,257'Patterned SOI regions on semiconductor chips'20046,566,177'Silicon-on-insulator vertical array device trench capacitor DRAM'20036,426,252'Silicon-on-insulator vertical array DRAM cell with self-aligned buried strap'20026,337,253'Process of making buried capacitor for silicon-on-insulator structure'20026,333,532'Patterned SOI regions in semiconductor chips'20016,188,122'Buried capacitor for silicon-on-insulator structure'20016,087,199'Method for fabricating a very dense chip package'20005,998,868'Very dense chip package'19995,784,311'Two-device memory cell on SOI for merged logic and memory applications'19985,541,427'SRAM cell with capacitor'19964,889,819'Method for fabricating shallow junctions by preamorphizing with dopant of same conductivity as substrate'19894,881,105'Integrated trench-transistor structure and fabrication process'19894,621,233'Non-destructive testing of semiconductors using acoustic wave method'19864,569,728'Selective anodic oxidation of semiconductors for pattern generation'1986Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
1986Patents assigned to RENSSELAER POLYTECH INST (1)· patent assignee history
1986Patents assigned to US AIR FORCE (1)· patent assignee history
1986Based in Troy, NY, US· patent location history
1986Based in Peekskill, NY, US· patent location history
1989–2018Patents assigned to IBM (15)· patent assignee history
1989–2018Based in Mahopac, NY, US· patent location history
2008–2011Patents assigned to GEN ELECTRIC (2)· patent assignee history
2008–2011Based in Fremont, CA, US· patent location history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| IBM | 15 | 1989–2018 |
| GEN ELECTRIC | 2 | 2008–2011 |
| RENSSELAER POLYTECH INST | 1 | 1986 |
| US AIR FORCE | 1 | 1986 |
Locations
| Location | Patents | Span |
|---|---|---|
| Mahopac, New York, US | 15 | 1989–2018 |
| Fremont, California, US | 2 | 2008–2011 |
| Troy, New York, US | 1 | 1986 |
| Peekskill, New York, US | 1 | 1986 |