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Inventor

Yasuhiko Ozawa

Inventor
Abiko, JP

Overview

28→
Patents
1977–2014
Patent span
Physics
Primary field (CPC G)

Patents· 28 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

H01Jprimary
H01JElectric discharge tubes or discharge lamps31%
G01NInvestigating or analysing materials by determining their chemical or physical properties22%
G06TImage data processing or generation, in general20%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h108%
G01FMeasuring volume, volume flow, mass flow or liquid level4%
G01RMeasuring electric variables4%
G03GElectrography4%
G06FElectric digital data processing4%
B66BElevators2%
G01PMeasuring linear or angular speed, acceleration, deceleration, or shock2%
PatentTitleYear
8,666,165'Scanning electron microscope'20148,428,336'Inspecting method, inspecting system, and method for manufacturing electronic devices'20138,263,935'Charged particle beam apparatus'20128,188,429'Scanning electron microscope for determining quality of a semiconductor pattern'20127,652,249'Charged particle beam apparatus'20107,605,381'Charged particle beam alignment method and charged particle beam apparatus'20097,439,505'Scanning electron microscope'20087,356,177'Defect image classifying method and apparatus and a semiconductor device manufacturing process based on the method and apparatus'20087,352,890'Method for analyzing circuit pattern defects and a system thereof'20087,235,782'Semiconductor inspection system'20077,181,060'Defect inspection method'20077,166,840'Method for determining depression/protrusion of sample and charged particle beam apparatus therefor'20077,068,834'Inspecting method, inspecting system, and method for manufacturing electronic devices'20067,062,081'Method and system for analyzing circuit pattern defects'20067,026,615'Semiconductor inspection system'20067,002,151'Scanning electron microscope'20066,872,943'Method for determining depression/protrusion of sample and charged particle beam apparatus therefor'20056,864,493'Charged particle beam alignment method and charged particle beam apparatus'20056,803,573'Scanning electron microscope'20046,756,589'Method for observing specimen and device therefor'20046,627,888'Scanning electron microscope'20036,553,323'Method and its apparatus for inspecting a specimen'20036,476,388'Scanning electron microscope having magnification switching control'2002RE034495'NMR imaging method'19945,049,940'Image forming apparatus'19914,844,077'NMR imaging method'19894,681,422'Paper supply device for an electrostatic photographic printer'19874,007,811'Control for elevator'1977

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

1977Based in Inazawa, JP· patent location history
1987–1991Patents assigned to TOKYO ELECTRIC CO LTD (2)· patent assignee history
1987–1991Based in Shizuoka, JP· patent location history
1989–2014Patents assigned to HITACHI LTD (22)· patent assignee history
1989–1994Based in Katsuta, JP· patent location history
2002–2014Based in Abiko, JP· patent location history
2004–2008Based in Tokyo, JP· patent location history
2010–2012Patents assigned to HITACHI HIGH TECH CORP (3)· patent assignee history
2012–2014Patents assigned to OZAWA YASUHIKO (4)· patent assignee history
2012–2014Patents assigned to YAMAGUCHI SATORU (2)· patent assignee history

Inventor activity

Assignee and location history derived from the patent record.

Assignees
AssigneePatentsSpan
HITACHI LTD221989–2014
OZAWA YASUHIKOself42012–2014
HITACHI HIGH TECH CORP32010–2012
TOKYO ELECTRIC CO LTD21987–1991
YAMAGUCHI SATORU22012–2014
Locations
LocationPatentsSpan
Abiko, JP212002–2014
Tokyo, JP22004–2008
Katsuta, JP21989–1994
Shizuoka, JP21987–1991
Inazawa, JP11977