Inventor

Henricus Wilhelmus Maria Van Buel

Inventor

Eindhoven, NL

Overview

2003–2020

Patent span

Physics

Primary field (CPC G)

Patents· 28 as inventor

Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.

G03Fprimary

G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices65%

H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1012%

G01BMeasuring length, thickness or similar linear dimensions7%

H10WGeneric packages, interconnections, connectors or other constructional details of devices covered by class h107%

G01NInvestigating or analysing materials by determining their chemical or physical properties5%

B81CProcesses or apparatus specially adapted for the manufacture or treatment of microstructural devices or systems2%

G02BOptical elements, systems or apparatus2%

PatentTitleYear

10,718,604Metrology method, target and substrate2020 10,386,176Metrology method, target and substrate2019 10,331,043Optimization of target arrangement and associated target2019 10,162,272Metrology method and apparatus, substrates for use in such methods, lithographic system and device manufacturing method2018 10,101,677Inspection apparatus for measuring properties of a target structure, methods of operating an optical system, method of manufacturing devices2018 8,576,374'Lithographic apparatus and method'2013 8,395,772'Sensor, a table and lithographic apparatus'2013 7,751,047'Alignment and alignment marks'2010 7,675,606'Lithographic apparatus and method'2010 7,562,686'Method and system for 3D alignment in wafer scale integration'2009 7,563,562'Lithographic apparatus and device manufacturing method'2009 7,480,028'Lithographic apparatus for imaging a front side or a back side of a substrate, method of substrate identification, device manufacturing method, substrate, and computer program'2009 7,463,337'Substrate table with windows, method of measuring a position of a substrate and a lithographic apparatus'2008 7,420,676'Alignment method, method of measuring front to backside alignment error, method of detecting non-orthogonality, method of calibration, and lithographic apparatus'2008 7,349,071'Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method'2008 7,342,642'Pre-aligning a substrate in a lithographic apparatus, device manufacturing method, and device manufactured by the manufacturing method'2008 7,253,884'Method of calibrating a lithographic apparatus, alignment method, computer program, data storage medium, lithographic apparatus, and device manufacturing method'2007 7,251,018'Substrate table, method of measuring a position of a substrate and a lithographic apparatus'2007 7,239,393'Calibration method for a lithographic apparatus and device manufacturing method'2007 7,193,231'Alignment tool, a lithographic apparatus, an alignment method, a device manufacturing method and device manufactured thereby'2007 7,113,258'Lithographic apparatus'2006 7,094,506'Lithographic apparatus and device manufacturing method'2006 7,084,955'Lithographic apparatus'2006 7,064,807'Lithographic apparatus'2006 7,041,996'Method of aligning a substrate, a computer program, a device manufacturing method and a device manufactured thereby'2006 6,936,385'Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods'2005 6,914,664'Lithographic apparatus, alignment method and device manufacturing method'2005 6,618,118'Optical exposure method, device manufacturing method and lithographic projection apparatus'2003

Career & activity timeline

Assembled from patent assignee/location history and declaration credentials.

2003–2020Patents assigned to ASML NETHERLANDS BV (28)· patent assignee history

2003–2010Based in Eindhoven, NL· patent location history

2013Patents assigned to VAN BUEL HENRICUS WILHELMUS MARIA (2)· patent assignee history

2013Patents assigned to BEST KEITH FRANK (1)· patent assignee history

2013Patents assigned to BROEKHUIJSE JEROEN THOMAS (1)· patent assignee history

2013Patents assigned to DZIOMKINA NINA VLADIMIROVNA (1)· patent assignee history

2013–2020Based in 's-Hertogenbosch, NL· patent location history

Inventor activity

Assignee and location history derived from the patent record.

Assignees

Assignee	Patents	Span
ASML NETHERLANDS BV	28	2003–2020
VAN BUEL HENRICUS WILHELMUS MARIAself	2	2013
BEST KEITH FRANK	1	2013
BROEKHUIJSE JEROEN THOMAS	1	2013
DZIOMKINA NINA VLADIMIROVNA	1	2013

Locations

Location	Patents	Span
Eindhoven, NL	21	2003–2010
's-Hertogenbosch, NL	7	2013–2020