Inventor
Jozef Maria Finders
Inventor
Veldhoven, NL
Overview
Patents· 48 as inventor
Public. Assignee & technology derived from the patent record. Each patent links to its LexDana page.
G03Fprimary
G03FPhotomechanical production of textured or patterned surfaces, e.g. for printing, for processing of semiconductor devices57%
H10PGeneric processes or apparatus for the manufacture or treatment of devices covered by class h1013%
G03BApparatus or arrangements for taking photographs or for projecting or viewing them8%
B82YSpecific uses or applications of nanostructures5%
G01BMeasuring length, thickness or similar linear dimensions2%
G02BOptical elements, systems or apparatus2%
G06FElectric digital data processing2%
H01LSemiconductor devices2%
Y10TTechnical subjects covered by former us classification2%
B05DProcesses for applying fluent materials to surfaces, in general1%
PatentTitleYear
10,775,705Patterning stack optimization202010,732,498Patterning device202010,551,736Methods for providing lithography features on a substrate by self-assembly of block copolymers202010,401,723Patterning device201910,331,042Method for a lithographic apparatus201910,240,250Method to provide a patterned orientation template for a self-assemblable polymer20199,811,002'Determination and application of non-monotonic dose sensitivity'20179,535,341'Method for a lithographic apparatus'20179,513,553'Methods of providing patterned epitaxy templates for self-assemblable block copolymers for use in device lithography'20169,513,109'Lithographic mask, lithographic apparatus and method'20169,285,685'Lithographic apparatus and device manufacturing method'20169,229,324'Methods of providing patterned templates for self-assemblable block copolymers for use in device lithography'20169,229,336'Lithographic apparatus and methods for determining an improved configuration of a lithographic apparatus'20169,170,502'Method of optimizing a lithographic process, device manufacturing method, lithographic apparatus, computer program product and simulation apparatus'20158,974,989'Lithographic mask, lithographic apparatus and method'20158,786,833'Lithographic method and arrangement for manufacturing a spacer'20148,780,325'Method for a lithographic apparatus'20148,711,330'Lithographic apparatus and device manufacturing method'20148,612,045'Optimization method and a lithographic cell'20138,426,088'Method for a lithographic apparatus'20138,416,394'Lithographic apparatus and device manufacturing method'20138,300,212'Device manufacturing method and lithographic apparatus'2012RE043643'Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby'20128,178,263'Method for a lithographic apparatus'20128,164,741'Lithographic apparatus and device manufacturing method'20128,142,964'Method of designing sets of mask patterns, sets of mask patterns, and device manufacturing method'20127,982,856'Lithographic apparatus and device manufacturing method'20117,961,296'Lithographic apparatus and device manufacturing method'20117,961,293'Lithographic apparatus and device manufacturing method'20117,824,842'Method of patterning a positive tone resist layer overlaying a lithographic substrate'20107,811,746'Method of patterning a positive tone resist layer overlaying a lithographic substrate'20107,732,110'Method for exposing a substrate and lithographic projection apparatus'20107,670,731'Method for exposing a substrate and lithographic projection apparatus'20107,655,368'Method for exposing a substrate and lithographic projection apparatus'20107,491,478'Lithographic apparatus and device manufacturing method'20097,471,375'Correction of optical proximity effects by intensity modulation of an illumination arrangement'20087,466,413'Marker structure, mask pattern, alignment method and lithographic method and apparatus'20087,456,931'Device manufacturing method, computer program product and lithographic apparatus'20087,425,397'Method of determining an illumination profile and device manufacturing method'20087,359,029'Lithographic apparatus and method of reducing thermal distortion'20087,352,435'Lithographic apparatus and device manufacturing method'20087,316,870'Device manufacturing method, mask set for use in the method, data set for controlling a programmable patterning device, method of generating a mask pattern and a computer program'20087,307,690'Device manufacturing method, computer program product and lithographic apparatus'20077,256,870'Method and apparatus for controlling iso-dense bias in lithography'20077,256,873'Enhanced lithographic resolution through double exposure'20076,977,714'Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby'20056,809,797'Lithographic apparatus, device manufacturing method, and device manufactured thereby'20046,795,163'Lithographic manufacturing process, lithographic projection apparatus, and device manufactured thereby'2004Career & activity timeline
Assembled from patent assignee/location history and declaration credentials.
2004–2020Patents assigned to ASML NETHERLANDS BV (48)· patent assignee history
2004–2020Based in Veldhoven, NL· patent location history
2008–2014Patents assigned to ZEISS CARL SMT AG (2)· patent assignee history
2012–2017Patents assigned to FINDERS JOZEF MARIA (15)· patent assignee history
2012–2017Patents assigned to DE WINTER LAURENTIUS CORNELIUS (5)· patent assignee history
2012–2016Patents assigned to DE PUTTER SANDER (2)· patent assignee history
Inventor activity
Assignee and location history derived from the patent record.
Assignees
| Assignee | Patents | Span |
|---|---|---|
| ASML NETHERLANDS BV | 48 | 2004–2020 |
| FINDERS JOZEF MARIAself | 15 | 2012–2017 |
| DE WINTER LAURENTIUS CORNELIUS | 5 | 2012–2017 |
| DE PUTTER SANDER | 2 | 2012–2016 |
| ZEISS CARL SMT AG | 2 | 2008–2014 |
Locations
| Location | Patents | Span |
|---|---|---|
| Veldhoven, NL | 48 | 2004–2020 |